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Optical emission spectroscopy by Ar$$^{3+}$$ ion sputtering of Ti surface under O$$_2$$ environment

酸素雰囲気中のTi表面のAr$$^{3+}$$イオンスパッタリングによる発光分光

本橋 健次*; 齋藤 勇一; 北澤 真一

Motohashi, Kenji*; Saito, Yuichi; Kitazawa, Sin-iti

Visible light emission from atoms and ions sputtered on a polycrystalline Ti surface was observed under irradiation of 30 keV Ar$$^{3+}$$ ions. A number of atomic lines of Ti I and II were observed in the wavelength of 250 to 850 nm. The intensity of Ti II emission increased 1.3-5.6 times by introducing oxygen molecules at a pressure of 5.8$$times$$10$$^{-5}$$ Pa, whereas that of Ti I decreased 0.5-0.8 times. Factors enhancing or reducing photon intensities were plotted as a function of energy of the corresponding electrons in the excited states for Ti atoms and Ti$$^+$$ ions. As a result, neither the bond-breaking model nor the kinetic model was applicable to the intensity change. It is considered that the local band structure model is appropriate for understanding the Ti I and II emissions.

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パーセンタイル:85.71

分野:Chemistry, Physical

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