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Optical emission spectroscopy by Ar$$^{3+}$$ ion sputtering of Ti surface under O$$_2$$ environment

酸素雰囲気中のTi表面のAr$$^{3+}$$イオンスパッタリングによる発光分光

本橋 健次*; 齋藤 勇一; 北澤 真一

Motohashi, Kenji*; Saito, Yuichi; Kitazawa, Sin-iti

Visible light emission from atoms and ions sputtered on a polycrystalline Ti surface was observed under irradiation of 30 keV Ar$$^{3+}$$ ions. A number of atomic lines of Ti I and II were observed in the wavelength of 250 to 850 nm. The intensity of Ti II emission increased 1.3-5.6 times by introducing oxygen molecules at a pressure of 5.8$$times$$10$$^{-5}$$ Pa, whereas that of Ti I decreased 0.5-0.8 times. Factors enhancing or reducing photon intensities were plotted as a function of energy of the corresponding electrons in the excited states for Ti atoms and Ti$$^+$$ ions. As a result, neither the bond-breaking model nor the kinetic model was applicable to the intensity change. It is considered that the local band structure model is appropriate for understanding the Ti I and II emissions.

使用言語

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English

掲載資料名

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Applied Surface Science

巻

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257

号

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13

ページ数

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p.5789 - 5792

発行年月

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2011/04

発表会議名

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開催年月

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開催都市

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開催国

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キーワード

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no keyword

特許データ

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PDF

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論文URL

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https://doi.org/10.1016/j.apsusc.2011.01.103

研究データの公開先DOI

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使用施設

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TIARA(イオン照射研究施設)

広報プレスリリース

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論文解説記事
(成果普及情報誌)

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受委託・共同研究相手機関

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東洋大学

Access

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- Accesses

InCites™

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パーセンタイル：20.88

分野：Chemistry, Physical

Altmetrics

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