Studies on krypton immobilization technology using ion-implantation and sputtering process; Parametric study of electrode geometry of enlarged krypton gas immobilizing chamber

Otani, Takehisa; Takahashi, Makoto; Akutsu, Tomoyuki*; Kimura, Norimichi; Tanaka, Yukiyoshi

Optimum geometry of electrodes, which were equipped at the top and bottom of the krypton gas immobilizing chamber, was investigated for improvement of the immobilizing capability with enlarged krypton gas immobilizing chamber.

Language	:	Japanese
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Meeting title	:	日本原子力学会2011年秋の大会
Held date	:	2011/09
Location (city)	:	北九州
Location (country)	:	日本
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Keywords	:	no keyword
Research Facility	:	クリプトン回収技術開発施設
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Registration No. : BB20110731
JAEA Abstracts No. :
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