Analysis of initial oxidation process of high-index Si surfaces using supersonic molecular beam, 2

Ono, Shinya*; Kanemura, Rui*; Abe, Sosuke*; Inoue, Kei*; Momose, Tatsuya*; Yoshigoe, Akitaka ; Teraoka, Yuden; Ogata, Shoichi*; Yasuda, Tetsuji*; Tanaka, Masatoshi*

no abstracts in English

Language	:	Japanese
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Meeting title	:	2012年(平成24年)春季第59回応用物理学関係連合講演会
Held date	:	2012/03
Location (city)	:	東京
Location (country)	:	日本
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Keywords	:	no keyword
Research Facility	:	SPring-8(大型放射光施設)
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Cooperating Institute	:	横浜国立大学

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Registration No. : BB20112960
JAEA Abstracts No. :
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