Preparation of a dense TiO $_{2}$ thin film by oxidizing metallic titanium

Yoshida, Fumiko; Tanaka, Momoko; Nagashima, Keisuke

We prepared a dense rutile TiO $_{2}$ thin film that has a refractive index as high as that of the bulk crystal by oxidizing metallic Ti thin film. The TiO $_{2}$ thin film with a thickness of 260 nm is optically transparent and has low coefficients of absorption and scattering. We annealed a Ti thin film at 1000 $^{circ}$ C for oxidation and crystallization after deposition of metallic Ti by electron-beam evaporation. By optimizing the annealing conditions, we obtained a rutile TiO $_{2}$ thin film with a refractive index of 2.72 at a wavelength of 1030 nm, the highest refractive index ever reported.

Language	:	English
Journal	:	Thin Solid Films
Volume	:	537
Number	:
Pages	:	p.23 - 27
Publication Year/Month	:	2013/06
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Paper URL	:	https://doi.org/10.1016/j.tsf.2013.04.134
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Keywords	:	no keyword
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Registration No. : AA20130113
JAEA Abstracts No. : 41000916
Paper Submission No. : 12865

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Preparation of a dense TiO thin film by oxidizing metallic titanium

Preparation of a dense TiO $_{2}$ thin film by oxidizing metallic titanium