Production of fullerene ions by combining of plasma sputtering with laser ablation

Yamada, Keisuke; Saito, Yuichi; Yokota, Wataru

A C production with combination of plasma sputtering and laser ablation was carried out. A C sample put in an electron cyclotron resonance type ion source was negatively biased and sputtered by argon plasma. A beam current of C decreased rapidly and recovered transiently by a single laser shot for ablation of the thin sample surface on the sputtered area. The time variation of beam current with laser shots at few-minute intervals is reported.