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Organic solvent-free water-developable sugar resist material derived from biomass in green lithography

Takei, Satoshi*; Oshima, Akihiro*; Ichikawa, Takumi*; Sekiguchi, Atsushi*; Kashiwakura, Miki*; Kozawa, Takahiro*; Tagawa, Seiichi*; Oyama, Tomoko; Ito, Shoji*; Miyasaka, Hiroshi*

Biomass-derived branched sugar resist material was developed for environmentally-friendly electron beam lithography (EBL). The developed resist enables organic solvent-free water-developable process. The resist performance was evaluated using 75 keV EBL system. Lines of 50-200 nm were fabricated with high sensitivity of 7 $$mu$$C/cm$$^{2}$$. The resist is developable in pure water at 23 $$^{circ}$$C for 60 s, and it has acceptable CF$$_{4}$$ etch selectivity.

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Category:Engineering, Electrical & Electronic

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