Organic solvent-free water-developable sugar resist material derived from biomass in green lithography

Takei, Satoshi*; Oshima, Akihiro*; Ichikawa, Takumi*; Sekiguchi, Atsushi*; Kashiwakura, Miki*; Kozawa, Takahiro*; Tagawa, Seiichi*; Oyama, Tomoko; Ito, Shoji*; Miyasaka, Hiroshi*

Biomass-derived branched sugar resist material was developed for environmentally-friendly electron beam lithography (EBL). The developed resist enables organic solvent-free water-developable process. The resist performance was evaluated using 75 keV EBL system. Lines of 50-200 nm were fabricated with high sensitivity of 7 C/cm $^{2}$ . The resist is developable in pure water at 23 $^{circ}$ C for 60 s, and it has acceptable CF $_{4}$ etch selectivity.

Language	:	English
Journal	:	Microelectronic Engineering
Volume	:	122
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Pages	:	p.70 - 76
Publication Year/Month	:	2014/06
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Paper URL	:	https://doi.org/10.1016/j.mee.2014.02.026
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Keywords	:	no keyword
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Registration No. : AA20131031
JAEA Abstracts No. : 42000752
Paper Submission No. : 14380

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