Evaluation of the yield for silicon-vacancy center formation by low-energy silicon ion implantation into diamond

Tamura, Shuto*; Koike, Godai*; Teraji, Tokuyuki*; Onoda, Shinobu; McGuinness, L.*; Rogers, L.*; Christoph, M.*; Naydenov, B.*; Wu, E.*; Yan, L.*; Jelezko, F.*; Oshima, Takeshi; Shinada, Takahiro*; Isoya, Junichi*; Tanii, Takashi*

no abstracts in English

Language	:	Japanese
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Meeting title	:	2014年秋季第75回応用物理学会学術講演会
Held date	:	2014/09
Location (city)	:	札幌
Location (country)	:	日本
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Keywords	:	ダイヤモンド
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Article of JAEA R&D Review	:
Cooperating Institute	:	筑波大学

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Registration No. : BB20141717
JAEA Abstracts No. :
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