Refine your search:     
Report No.

Surface stress measurement of Si(111) 7$$times$$7 reconstruction by comparison with hydrogen-terminated 1$$times$$1 surface

Asaoka, Hidehito; Uozumi, Yuki

We have focused on measurements of the surface stress in Si(111) as a function of 7$$times$$7 reconstruction by comparison with the hydrogen (H)-terminated Si(111) 1$$times$$1 surface. In order to obtain information on both the surface stress and the surface reconstruction simultaneously, we have combined the surface-curvature and the reflection-high-energy-electron-diffraction instrumentations in an identical ultrahigh vacuum system. The stress evolution shows a decrease of tensile stress corresponding to the formation of H-termination at the beginning of the atomic H exposure of Si(111) 7$$times$$7 surface. After the above treatment, a complete transformation of the surface structure occurs from the reconstructed surface to the 1$$times$$1 one. As a result, we find the H-terminated Si(111) 1$$times$$1 surface releases 1.7 N/m (=J/m$$^{2}$$), or (1.4 eV/(1$$times$$1 unit cell)), of the surface energy from the strong tensile Si(111) 7$$times$$7 reconstruction.



- Accesses





[CLARIVATE ANALYTICS], [WEB OF SCIENCE], [HIGHLY CITED PAPER & CUP LOGO] and [HOT PAPER & FIRE LOGO] are trademarks of Clarivate Analytics, and/or its affiliated company or companies, and used herein by permission and/or license.