Cl on Si(100)2
1 by means of SR-XPSTsukada, Chie; Yoshida, Hikaru; Okada, Michio*; Yoshigoe, Akitaka 
; Yaita, Tsuyoshi
Cs in clay mineral will be easy to desorb as halide. We should investigate the desorption mechanism. The clay mineral is constructed mainly by oxide with Si and Al. Thus, Si substrate and CH
Cl are selected as the reaction model materials. The final purpose is to reveal the reaction for CHCl molecular beam on Cs/Si substrate by means of XPS with synchrotron radiation (SR-XPS). As the first step, the purpose in this study is to reveal the adsorption reaction for CHCl molecular beam on Si(100)21 by means of SR-XPS. The CHCl will adsorb at CH and/or Cl group on the Si dimer atom, respectively.
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: | Japanese |
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: | 2016/09 |
Location (city) |
: | 新潟 |
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: | 日本 |
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Keywords |
: | Si(100)2×1; CH3Cl; 吸着反応; 福島第一原子力発電所事故; Fukushima Daiichi Nuclear Power Station Accident |
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