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Report No.

Study on adsorption reaction of CH$$_{3}$$Cl on Si(100)2$$times$$1 by means of SR-XPS

Tsukada, Chie; Yoshida, Hikaru; Okada, Michio*; Yoshigoe, Akitaka ; Yaita, Tsuyoshi

Cs in clay mineral will be easy to desorb as halide. We should investigate the desorption mechanism. The clay mineral is constructed mainly by oxide with Si and Al. Thus, Si substrate and CH$$^{3}$$Cl are selected as the reaction model materials. The final purpose is to reveal the reaction for CH$$^{3}$$Cl molecular beam on Cs/Si substrate by means of XPS with synchrotron radiation (SR-XPS). As the first step, the purpose in this study is to reveal the adsorption reaction for CH$$^{3}$$Cl molecular beam on Si(100)2$$times$$1 by means of SR-XPS. The CH$$^{3}$$Cl will adsorb at CH$$^{3}$$ and/or Cl group on the Si dimer atom, respectively.



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