Fabrication of Si(110)-162 surface by low temperature desorption of oxide layer

Suzuki, Shota; Yano, Masahiro ; Uozumi, Yuki; Asaoka, Hidehito ; Yamaguchi, Kenji*

no abstracts in English

Language	:	Japanese
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Meeting title	:	2016年真空・表面科学合同講演会; 第36回表面科学学術講演会/第57回真空に関する連合講演会
Held date	:	2016/11
Location (city)	:	名古屋
Location (country)	:	日本
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Keywords	:	Si(110); 酸化層脱離; 表面再構成
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Registration No. : BB20161426
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