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Report No.

Detection on molecularly oxygen adsorbate during room-temperature oxidation at Si(100) surface; Synchrotron radiation light shed light on issue over 3 decades

Yoshigoe, Akitaka ; Taga, Ryo*; Ogawa, Shuichi*; Takakuwa, Yuji*

In this conference, the experimental evidence on the existence of molecularly adsorbed oxygen during the oxidation of Si(100)2$$times$$1 surface, which was considered to be absent, is reported. Synchrotron radiation photoelectron spectroscopy measurements was used to reveal its presence during the oxidation at room temperature and -150$$^{circ}$$C.



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