Si(100)表面室温酸化中の「分子状吸着酸素」の発見; 放射光が30年来の謎を解く

Detection on molecularly oxygen adsorbate during room-temperature oxidation at Si(100) surface; Synchrotron radiation light shed light on issue over 3 decades

吉越 章隆 ; 多賀 稜*; 小川 修一*; 高桑 雄二*

Yoshigoe, Akitaka; Taga, Ryo*; Ogawa, Shuichi*; Takakuwa, Yuji*

本会議では、長年その存在が確認できなかった分子状吸着酸素をSi(100)21表面酸化中に観測することに成功したことを報告する。放射光光電子分光測定を使って室温および-150Cの酸化条件で検証できた。

In this conference, the experimental evidence on the existence of molecularly adsorbed oxygen during the oxidation of Si(100)21 surface, which was considered to be absent, is reported. Synchrotron radiation photoelectron spectroscopy measurements was used to reveal its presence during the oxidation at room temperature and -150C.