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Initial oxidation of Cu$$_{3}$$Pd(111) surface

Tsuda, Yasutaka*; Makino, Takamasa*; Tsukada, Chie; Yoshigoe, Akitaka ; Fukuyama, Tetsuya*; Okada, Michio*

It is well-known that oxidation is an important chemical reactions in corrosion processes. Cu$$_{3}$$Pd has an attracting material due to its catalytic property and its oxidation is the important subject. In this presentation, initial oxidation processes at the Cu$$_{3}$$Pd(111) surface was studied by using molecular beams. In situ photoemission measurements were conducted using surface chemistry apparatus at BL23SU at SPring-8. Single crystal Cu$$_{3}$$Pd was used after cleaning by means of Ar ion sputtering and annealing. It was found that molecular beams facilitate oxidation compared to that for backfilling condition. Furthermore, diffusion of surface atoms seems to be driven with increasing surface temperature.

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