Initial oxidation of Cu $_{3}$ Pd(111) surface

Tsuda, Yasutaka*; Makino, Takamasa*; Tsukada, Chie; Yoshigoe, Akitaka ; Fukuyama, Tetsuya*; Okada, Michio*

It is well-known that oxidation is an important chemical reactions in corrosion processes. Cu $_{3}$ Pd has an attracting material due to its catalytic property and its oxidation is the important subject. In this presentation, initial oxidation processes at the Cu $_{3}$ Pd(111) surface was studied by using molecular beams. In situ photoemission measurements were conducted using surface chemistry apparatus at BL23SU at SPring-8. Single crystal Cu $_{3}$ Pd was used after cleaning by means of Ar ion sputtering and annealing. It was found that molecular beams facilitate oxidation compared to that for backfilling condition. Furthermore, diffusion of surface atoms seems to be driven with increasing surface temperature.

Language	:	Japanese
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Meeting title	:	2016年秋季第77回応用物理学会学術講演会
Held date	:	2016/09
Location (city)	:	新潟
Location (country)	:	日本
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Keywords	:	表面酸化; 腐食; 放射光光電子分光; 反応ダイナミクス
Research Facility	:	SPring-8(大型放射光施設)
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Registration No. : BB20170430
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Initial oxidation of CuPd(111) surface

Initial oxidation of Cu $_{3}$ Pd(111) surface