Study on adsorption reaction of CH $_{3}$ Cl on Si(100)21 by means of SR-XPS

Tsukada, Chie; Yoshida, Hikaru; Okada, Michio*; Yoshigoe, Akitaka ; Yaita, Tsuyoshi

To achieve Cs decontamination in clay minerals by using CH $_{3}$ Cl gas, we have investigated the adsorption reactions and adsorption states of CH $_{3}$ Cl at Si surfaces. In this conference, we report that dissociative adsorption of CH $_{3}$ Cl to form CH $_{3}$ and Cl was revealed from the high energy-resolutions photoemission spectra.

Language	:	Japanese
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Meeting title	:	2016年秋季第77回応用物理学会学術講演会
Held date	:	2016/09
Location (city)	:	新潟
Location (country)	:	日本
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Keywords	:	Cs除去; CH3Cl; 分子吸着反応; 放射光光電子分光; 福島第一原子力発電所事故; Fukushima Daiichi Nuclear Power Station Accident
Research Facility	:	SPring-8(大型放射光施設)
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Registration No. : BB20170340
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Study on adsorption reaction of CHCl on Si(100)21 by means of SR-XPS

Study on adsorption reaction of CH $_{3}$ Cl on Si(100)21 by means of SR-XPS