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Uniform Si nano-dot fabrication using reconstructed structure of Si(110)

Si(110)上再構成構造を利用した規定された形状のSiナノドットの作製

矢野 雅大; 魚住 雄輝*; 保田 諭; 朝岡 秀人

Yano, Masahiro; Uozumi, Yuki*; Yasuda, Satoshi; Asaoka, Hidehito

We have observed oxide decomposition process on Si(110). We have succeeded to observe metastable area and state by means of scanning tunneling microscope (STM) and X-ray photoemission spectroscopy (XPS), respectively.

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パーセンタイル:60.22

分野:Physics, Applied

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