Improvement in sputtering rate uniformity over large deposition area of large-scale ion beam sputtering system

Maruyama, Ryuji ; Yamazaki, Dai ; Akutsu, Kazuhiro*; Hanashima, Takayasu*; Miyata, Noboru*; Aoki, Hiroyuki ; Soyama, Kazuhiko

no abstracts in English

Language	:	English
Journal	:	JPS Conference Proceedings (Internet)
Volume	:	33
Number	:
Pages	:	p.011092_1 - 011092_6
Publication Year/Month	:	2021/03
Meeting title	:	3rd J-PARC Symposium (J-PARC 2019)
Held date	:	2019/09
Location (city)	:	Tsukuba
Location (country)	:	Japan
Patent information	:
PDF	:
Paper URL	:	https://doi.org/10.7566/JPSCP.33.011092
DOI for research data	:
Keywords	:	no keyword
Research Facility	:	J-PARC物質・生命科学実験施設
Press Release	:
Article of JAEA R&D Review	:
Cooperating Institute	:

Accesses	:	- Accesses
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Registration No. : BB20190986
JAEA Abstracts No. : 49000522
Paper Submission No. : 24107

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