検索対象:     
報告書番号:
※ 半角英数字
 年 ~ 
 年

$$^{rm 206,207,208,nat}$$Pb(p,x)$$^{194}$$Hg and $$^{209}$$Bi(p,x)$$^{194}$$Hg excitation functions in the energy range 0.04 - 2.6 GeV

$$^{rm 206,207,208,nat}$$Pb(p,x)$$^{194}$$Hg及び$$^{209}$$Bi(p,x)$$^{194}$$Hg反応に対するエネルギー範囲0.04 - 2.6GeVの励起関数

Titarenko, Yu. E.*; Batyaev, V. F.*; Pavlov, K. V.*; Titarenko, A. Yu.*; Malinovskiy, S. V.*; Rogov, V. I.*; Zhivun, V. M.*; Kulevoy, T. V.*; Chauzova, M. V.*; Khalikov, R. S.*; Ignatyuk, A. V.*; Blandinskiy, V. Yu.*; Kovalishin, A. A.*; Baznat, M. I.*; Stankovskiy, A. Yu.*; Dubrouski, A. I.*; Kiyavitskaya, H. I.*; Xue, T.*; Tian, Y.*; Zeng, M.*; Zeng, Z.*; Normahmedov, O.*; 佐藤 達彦  

Titarenko, Yu. E.*; Batyaev, V. F.*; Pavlov, K. V.*; Titarenko, A. Yu.*; Malinovskiy, S. V.*; Rogov, V. I.*; Zhivun, V. M.*; Kulevoy, T. V.*; Chauzova, M. V.*; Khalikov, R. S.*; Ignatyuk, A. V.*; Blandinskiy, V. Yu.*; Kovalishin, A. A.*; Baznat, M. I.*; Stankovskiy, A. Yu.*; Dubrouski, A. I.*; Kiyavitskaya, H. I.*; Xue, T.*; Tian, Y.*; Zeng, M.*; Zeng, Z.*; Normahmedov, O.*; Sato, Tatsuhiko

0.04から2.6GeVの陽子入射による$$^{rm 206,207,208,nat}$$Pb及び天然Biからの$$^{194}$$Hg生成断面積を直接$$gamma$$線スペクトロメトリの手法を用いて測定した。測定した結果は、モンテカルロ計算コードMCNP6.1, PHITS, Geant4及び核反応コードTALYSと比較した。

The paper presents the $$^{194}$$Hg production cross-sections measured by the direct gamma-spectrometry technique in the samples of lead enriched with isotopes 206, 207 and 208, as well as in the samples of natural lead and bismuth, irradiated by protons of 11 energies in the range from 0.04 to 2.6 GeV. The obtained experimental results are compared with the previous measurements, with the TENDL-2019 data-library evaluations and the simulated data by means of the high-energy transport codes MCNP6.1 (CEM03.03), PHITS (INCL4.6/GEM), Geant4 (INCL++/ABLA) and the nuclear reaction code TALYS.

Access

:

- Accesses

InCites™

:

Altmetrics

:

[CLARIVATE ANALYTICS], [WEB OF SCIENCE], [HIGHLY CITED PAPER & CUP LOGO] and [HOT PAPER & FIRE LOGO] are trademarks of Clarivate Analytics, and/or its affiliated company or companies, and used herein by permission and/or license.