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Toyoda, Satoshi*; Yoshimura, Masashi*; Sumida, Hirosuke*; Mineoi, Susumu*; Machida, Masatake*; Yoshigoe, Akitaka; Yoshikawa, Akira*; Suzuki, Satoru*; Yokoyama, Kazushi*
Hoshako, 35(3), p.200 - 206, 2022/05
The present status of spatiotemporal depth profiling analysis of the multilayer stacked film interface based on Ambient Pressure X-ray Photoelectron Spectroscopy (APXPS) is presented. To begin with, depth profiles of the multilayer stacked film interfaces have been achieved by time-division Near Ambient Pressure Hard X-ray Angle-Resolved PhotoEmission Spectroscopy data. We then have promoted our methods to quickly perform peak fittings and depth profiling from time-division angle resolved AP-XPS data including spatial resolution, which enables us to realize spatiotemporal depth profiles of the interfaces under reaction conditions such as oxidation and reduction. In addition, it is found that the traditional maximum entropy method (MEM) combined with Jackknife averaging of sparse modeling is effective to perform dynamic measurement of depth profiles with high precision.
Ohira, Masashi*; Katashima, Takuya*; Naito, Mitsuru*; Aoki, Daisuke*; Yoshikawa, Yusuke*; Iwase, Hiroki*; Takata, Shinichi; Miyata, Kanjiro*; Chung, U.-I.*; Sakai, Takamasa*; et al.
Advanced Materials, 34(13), p.2108818_1 - 2108818_9, 2022/01
Times Cited Count：23 Percentile：88.03(Chemistry, Multidisciplinary)
measurement and analysis techniques in X-ray photoelectron spectroscopy; From NAP-HARPES to 4D-XPSToyoda, Satoshi*; Yamamoto, Tomoki*; Yoshimura, Masashi*; Sumida, Hirosuke*; Mineoi, Susumu*; Machida, Masatake*; Yoshigoe, Akitaka; Suzuki, Satoru*; Yokoyama, Kazushi*; Ohashi, Yuji*; et al.
Vacuum and Surface Science, 64(2), p.86 - 91, 2021/02
We have developed measurement and analysis techniques in X-ray photoelectron spectroscopy. To begin with, time-division depth profiles of gate stacked film interfaces have been achieved by NAP-HARPES (Near Ambient Pressure Hard X-ray Angle-Resolved Photo Emission Spectroscopy) data. We then have promoted our methods to quickly perform peak fittings and depth profiling from time-division ARPES data, which enables us to realize 4D-XPS analysis. It is found that the traditional maximum entropy method (MEM) combined with Jackknife averaging of sparse modeling in NAP-HARPES data is effective to perform dynamic measurement of depth profiles with high precision.
Shimizu, Takeshi*; Wang, H.*; Tanifuji, Naoki*; Matsumura, Daiju; Yoshimura, Masashi*; Nakanishi, Koji*; Ota, Toshiaki*; Yoshikawa, Hirofumi*
Chemistry Letters, 47(5), p.678 - 681, 2018/05
Times Cited Count：12 Percentile：38.14(Chemistry, Multidisciplinary)Mitsui, Seiichiro; Yoshikawa, Hideki; Tokuda, Masashi*; Seiki, Yuji*
Nihon Bunkazai Kagakkai Dai-28-Kai Taikai Kenkyu Happyo Yoshishu, p.54 - 55, 2011/06
Ancient iron and bronze artifacts (ca 1,500 year old) excavated from Nishizuka Mound, Fukui Prefecture, were studied as archaeological analogues for metal overpack corrosion. As for corrosion state, we analyzed corrosion volume with a X-ray CT and corrosion products with a portable XRD/XRF. As results, we found that corrosion volume of bronze artifacts were smaller than those of iron artifacts and that cassiterite (SnO
) was present as one of corrosion products on the surface of the bronze artifacts. This suggested that the cassiterite inhibited corrosion reaction of the bronze artifact.
layersUmenyi, A. V.*; Hommi, Masashi*; Kawashiri, Shinya*; Shinagawa, Teruyoshi*; Miura, Kenta*; Hanaizumi, Osamu*; Yamamoto, Shunya; Inoue, Aichi; Yoshikawa, Masahito
Key Engineering Materials, 459, p.168 - 172, 2011/04
A new type of two-dimensional photonic crystal (2-D PhC) waveguide was designed using finite difference time domain method to operate at a wavelength of 1.55 
m applicable to optical fiber-communication systems. We estimated that a triangular-lattice 2-D PhC structure formed by air holes with a diameter of 465 nm and a period of 664 nm suit our purpose. To form a core of the waveguide, Si ions were implanted into a SiO layer by using a 400-kV ion implanter. The implantation energy was 80 keV and the implantation amount was 1
10
ions/cm
. The electron beam resist was spin-coated on a substrate and the designed pattern was written lithographically in the resist using Electron Beam. Atomic force microscope measurements revealed that the diameter and the period of air holes of the waveguide were 466 and 666 nm. These values were nearly equal to the designed ones. We thus succeeded in fabricating 2-D PhC waveguides in a Si-ion-implanted SiO layer.
Tochigi, Yoshikatsu; Yoshikawa, Hideki; Aoki, Kazuhiro; Yui, Mikazu; Asano, Takahiro*; Honjo, Hideko*; Haginuma, Masashi*; Kawakami, Yasushi*; Suzuki, Kazunori*
JAEA-Research 2008-025, 55 Pages, 2008/03
JAEA-Research-2008-025.pdf:8.55MB
Results of joint research on fiscal year 2006 between Japan Atomic Energy Agency (JAEA) and Institute of Research and Innovative (IRI) titled as "Study on investigation of microbial effects for geological disposal" are described in this report. The objective of this study is to develop a method for estimating microbial effects for barrier performance of geological disposal site. The modeling was performed to examine the effect on the change in groundwater chemistry (mainly by electron acceptors) by microbial metabolism as well as microbial activities. In order to use the data (chemical composition, biomass, etc.) in the MINT code, groundwater was collected from the drilled well prepared for chemical and microbial analyses of groundwater. The well was prepared in observation field near Horonobe Underground Research Center of JAEA in fiscal year 2006. Then, numerical modeling using collected data of groundwater with numerical modeling program code "MINT" considering microbial effects was carried out. The modeling was carried out to evaluate the microbial effect for stability of chemical and microbial composition of groundwater. As the result of the modeling, relatively low microbial effect for groundwater composition was observed in particular for the concentration of dissolved methane, methanogen, sulfur reducing bacteria (SRB) and sulfur ion. The result shows that low redox potential is stable in the well in spite of shallow depth.
Tochigi, Yoshikatsu; Yoshikawa, Hideki; Aoki, Kazuhiro; Yui, Mikazu; Honjo, Hideko*; Haginuma, Masashi*; Kawakami, Yasushi*; Suzuki, Kazunori*
JAEA-Research 2007-010, 51 Pages, 2007/03
JAEA-Research-2007-010.pdf:4.82MB
Results of joint research on Fiscal 2005 between Japan Atomic Energy Agency (JAEA) and Institute of Research and Innovative (IRI) titled as "Study for investigation of microbial effects on geological disposal" are described in this report. The objective of this study is constructing advanced method for examining microbial effect for barrier performance of geological disposal site. In fiscal 2005, groundwater and rock core sample have been collected from drilled well on observation field near Horonobe Underground Research Center of JAEA and chemical analysis for collected ground water have been carried out and sensitivity analysis for existing observed data of groundwater with numerical analysis program code "MINT" considering microbial effect have been carried out.
Sato, Hitoshi*; Yoshikawa, Kunta*; Hiraoka, Koichi*; Arita, Masashi*; Fujimoto, Koji*; Kojima, Kenichi*; Muro, Takayuki*; Saito, Yuji; Sekiyama, Akira*; Suga, Shigemasa*; et al.
Physical Review B, 69(16), p.165101_1 - 165101_6, 2004/04
Times Cited Count：33 Percentile：77.20(Materials Science, Multidisciplinary)no abstracts in English
Miura, Kenta*; Hommi, Masashi*; Hanaizumi, Osamu*; Yamamoto, Shunya; Sugimoto, Masaki; Yoshikawa, Masahito; Inoue, Aichi
no journal, ,
no abstracts in English
Miura, Kenta*; Umenyi, A. V.*; Hanaizumi, Osamu*; Sato, Takahiro; Ishii, Yasuyuki; Okubo, Takeru; Yamazaki, Akiyoshi; Koka, Masashi; Yokoyama, Akihito; Kada, Wataru; et al.
no journal, ,
no abstracts in English
Yoshikawa, Masashi*; Minowa, Kazuki*; Matsuura, Haruaki*; Hasegawa, Kenta; Arai, Yoichi; Watanabe, So; Konishi, Yasuhiro*
no journal, ,
no abstracts in English
Hirohata, Yuko*; Tanabe, Tetsuo*; Oya, Yasuhisa*; Shibahara, Takahiro*; Sugiyama, Kazuyoshi*; Oyaizu, Makoto*; Yoshikawa, Akira*; Yoshida, Masashi*; Arai, Takashi; Masaki, Kei; et al.
no journal, ,
no abstracts in English
Hirohata, Yuko*; Tanabe, Tetsuo*; Oya, Yasuhisa*; Shibahara, Takahiro*; Sugiyama, Kazuyoshi*; Oyaizu, Makoto*; Yoshikawa, Akira*; Yoshida, Masashi*; Arai, Takashi; Masaki, Kei; et al.
no journal, ,
no abstracts in English
Miura, Kenta*; Tanemura, Tsuyoshi*; Hommi, Masashi*; Hanaizumi, Osamu*; Yamamoto, Shunya; Takano, Katsuyoshi; Sugimoto, Masaki; Yoshikawa, Masahito
no journal, ,
no abstracts in English
Umenyi, A. V.*; Hommi, Masashi*; Miura, Kenta*; Hanaizumi, Osamu*; Yamamoto, Shunya; Inoue, Aichi; Yoshikawa, Masahito
no journal, ,
Various works on silicon (Si)-based luminescent materials utilizing the quantum confinement effect, such as Si nanocrystals (Si-NC's), have been reported. Typical fabrication methods of Si-NC's are co-sputtering of Si and SiO, Si-ion implantation into SiO plates, and so on. In this work, we observed ultraviolet (UV)-light emission from Si-ion-implanted fused-silica substrates under different implanting conditions. The implantation energy was 80 keV, and the implantation amount was 210 ions/cm. The Si-implanted substrates were annealed at 1100
1250
C. Photoluminescence (PL) spectra were measured with excitation using a He-Cd laser. UV-PL spectra having peaks around a wavelength of 370 nm were observed from all the samples. The UV-peak wavelengths of the samples are almost the same in spite of the various annealing temperatures. Si-ion-implanted fused-silica are expected to be useful as light sources for next-generation optical-disk systems.
Yoshikawa, Hideki; Tokuda, Masashi*; Seiki, Yuji*
no journal, ,
no abstracts in English
Miura, Kenta*; Kikuchi, Shusuke*; Kiryu, Hiromu*; Inada, Kazuki*; Ozawa, Yusuke*; Hanaizumi, Osamu*; Yamamoto, Shunya; Sugimoto, Masaki; Yoshikawa, Masahito; Kawaguchi, Kazuhiro; et al.
no journal, ,
no abstracts in English
Hirohata, Yuko*; Tanabe, Tetsuo*; Oya, Yasuhisa*; Arai, Takashi; Masaki, Kei; Okuno, Kenji*; Sugiyama, Kazuyoshi*; Oyaizu, Makoto*; Yoshikawa, Akira*; Yoshida, Masashi*
no journal, ,
no abstracts in English
Li(d,t)
Li reactionHashimoto, Takashi; Miyatake, Hiroari; Mitsuoka, Shinichi; Nishio, Katsuhisa; Sato, Tetsuya; Ichikawa, Shinichi; Osa, Akihiko; Matsuda, Makoto; Ishiyama, Hironobu*; Watanabe, Yutaka*; et al.
no journal, ,
no abstracts in English
