Initialising ...
Initialising ...
Initialising ...
Initialising ...
Initialising ...
Initialising ...
Initialising ...
Ito, Naoki*; Mase, Atsushi*; Kogi, Yuichiro*; Seko, Noriaki; Tamada, Masao; Shimazu, Hiroshi*; Sakata, Eiji*
Japanese Journal of Applied Physics, 49(10), p.106506_1 - 106506_5, 2010/10
Times Cited Count：0 Percentile：0.00(Physics, Applied)As the importance of advanced millimeter-wave diagnostics increases, the fabrications of high-performance devices and components become essential. This paper describes the development of millimeter-wave planar antennas using low-loss fluorine substrates. The problems to be solved for the present purpose are the low degree of adhesion between copper foil and fluorine substrate and the accuracy of device pattern using conventional fabrication techniques. In order to solve these problems, surface treatment of fluorine films and a fabrication method using Electro-Fine-Forming (EF2) are proposed. In order to confirm the performance of the treated films, microstrip lines (MSL) and the planar patch antennas with low-sidelobe level in E-plane are designed and fabricated on the conventional fluorine substrates and on the grafted-PTFE (Polytetrafluoroethylene) films.
Ito, Naoki*; Mase, Atsushi*; Kogi, Yuichiro*; Seko, Noriaki; Tamada, Masao; Sakata, Eiji*
JAEA-Review 2008-055, JAEA Takasaki Annual Report 2007, P. 42, 2008/11
no abstracts in English
Ito, Naoki*; Mase, Atsushi*; Kogi, Yuichiro*; Seko, Noriaki; Tamada, Masao; Sakata, Eiji*
Proceedings of 11th IEEE International Conference on Communication Technology (ICCT 2008), 3 Pages, 2008/11
As the importance of advanced microwave and millimeter-wave diagnostics increases, the fabrications of high-performance planar devices become essential. This paper describes the development of planar devices such as antennas using low-loss fluorine materials. The problems to be solved for the present purpose are the low degree of adhesion between copper foil and fluorine substrate and the accuracy of device pattern using conventional fabrication techniques. In order to solve these problems, surface treatment of fluorine films and a fabrication method using Electro-Fine-Forming (EF2) are proposed. The peel adhesion strength between the metal and the fluorine films and the value of dielectric constant of the fluorine films before and after grafting are reported. In order to confirm the performance of the treated films, microstrip lines are fabricated on the conventional fluorine substrates and on the grafted-PTFE (Polytetrafluoroethylene) films. The prototype antennas using fluorine substrates with EF2 fabrication technique are also introduced.
Ito, Naoki*; Mase, Atsushi*; Kogi, Yuichiro*; Tateishi, Naoyuki*; Seko, Noriaki; Tamada, Masao; Sakata, Eiji*
JAEA-Review 2007-060, JAEA Takasaki Annual Report 2006, P. 37, 2008/03
no abstracts in English
Ito, Naoki*; Mase, Atsushi*; Kogi, Yuichiro*; Seko, Noriaki; Tamada, Masao; Shen, Z.*; Yang, L.*; Domier, C. W.*; Luhmann, N. C. Jr.*; Sakata, Eiji*
Plasma and Fusion Research (Internet), 2, p.S1042_1 - S1042_4, 2007/11
As the importance of plasma imaging diagnostics increases, the fabrication of high performance millimeter-wave planar components becomes essential. This paper describes the development of high performance millimeter-wave planar components such as antennas and filters using low-loss fluorine substrate. The problems to be solved are low degree of adhesion between copper foil and fluorine substrate and shape of antenna pattern. In order to solve the problems, surface treatment of fluorine films and a fabrication method using Electro Fine Forming (EF2) are utilized.
Mase, Atsushi*; Kogi, Yuichiro*; Hojo, Hitoshi*; Yoshikawa, Masayuki*; Itakura, Akiyoshi*; Chujo, T.*; Tokuzawa, Tokihiko*; Kawahata, Kazuo*; Nagayama, Yoshio*; Oyama, Naoyuki; et al.
Fusion Science and Technology, 51(2T), p.52 - 57, 2007/02
Times Cited Count：3 Percentile：25.12(Nuclear Science & Technology)no abstracts in English
Ito, Naoki*; Mase, Atsushi*; Seko, Noriaki; Tamada, Masao; Sakata, Eiji*; Kogi, Yuichiro*
Japanese Journal of Applied Physics, Part 1, 45(12), p.9244 - 9246, 2006/12
Times Cited Count：5 Percentile：20.62(Physics, Applied)Polytetrafluoroethylene (PTFE) and perfluoro ethylene-propylene (PFEP) have many desirable properties for application to electronic devices, such as low dielectric constant and loss tangent. However, the weak adhesion of the polymer to various metals, associated with the chemical inertness of the fluorine resin surface, fails to satisfy many of the industry requirements. Surface treatment of PTFE and PFEP by radiation-induced graft polymerization was carried out to improve the adhesion. Peel adhesion strengths of 10.3 N/cm and 14.5 N/cm were attained for PTFE/Cu and PFEP/Cu, respectively by the treatment. In addition, the dielectric function of grafted PTFE and grafted PFEP remained almost unchanged after the graft polymerization.
Ito, Naoki*; Mase, Atsushi*; Seko, Noriaki; Tamada, Masao; Sakata, Eiji*; Kogi, Yuichiro*
Proceedings of Asia-Pacific Microwave Conference 2006 (APMC 2006), Vol.1 (CD-ROM), p.2031 - 2033, 2006/12
Polytetrafluoroethylene (PTFE) has many desirable properties for substrates of millimeter-wave planar antennas such as low dielectric constant and loss tangent. However, it has weak adhesion to various metals. Surface treatment of PTFE via radiation-induced graft polymerization was carried out to improve the adhesion. The peel adhesion strength of the PTFE/Cu was attained to be 10.3 N/cm by the treatment. The dielectric function of grafted-PTFE remained almost unchanged after the graft polymerization. The design and fabrication of millimeter-wave antennas on the treated PTFE substrates have been performed using electro-fine-forming (EF2) technology.
Bruskin, L. G.; Oyama, Naoyuki; Shinohara, Koji; Miura, Yukitoshi; Kogi, Yuichiro*; Mase, Atsushi*; Hasegawa, Makoto*; Hanada, Kazuaki*
Review of Scientific Instruments, 74(3), p.1473 - 1476, 2003/03
Times Cited Count：5 Percentile：32.92(Instruments & Instrumentation)An analytical model of fluctuation reflectometry is developed, which is capable of handling the plasma profiles of arbitrary shape and curvature. The experimental profiles are piece-wise approximated by the functions, which allow for the integration of the full-wave O-mode equation. The model is applied to the reflectometry of the JT-60U tokamak plasma to provide a preliminary estimation of the fluctuation amplitude and spectral width.
Bruskin, L. G.; Mase, Atsushi*; Yamamoto, A.*; Kogi, Yuichiro*
Plasma Physics and Controlled Fusion, 43(10), p.1333 - 1349, 2001/10
Times Cited Count：15 Percentile：44.80(Physics, Fluids & Plasmas)no abstracts in English
Ito, Naoki*; Mase, Atsushi*; Kogi, Yuichiro*; Seko, Noriaki; Tamada, Masao; Sakata, Eiji*
no journal, ,
no abstracts in English
Sakoda, Takuya*; Kogi, Yuichiro*; Mase, Atsushi*; Ito, Naoki*; Nagayama, Yoshio*; Yamaguchi, Soichiro*; Kawahata, Kazuo*; Sakata, Eiji*; Oyama, Naoyuki
no journal, ,
no abstracts in English
Kudo, Kosei*; Kogi, Yuichiro*; Ignatenko, M.*; Ito, Naoki*; Mase, Atsushi*; Nagayama, Yoshio*; Yamaguchi, Soichiro*; Kawahata, Kazuo*; Sakata, Eiji*; Oyama, Naoyuki
no journal, ,
no abstracts in English
Ito, Naoki*; Mase, Atsushi*; Kogi, Yuichiro*; Seko, Noriaki; Tamada, Masao; Matsumura, Tomohiro*; Shimazu, Hiroshi*; Sakata, Eiji*
no journal, ,
no abstracts in English
Ito, Naoki*; Sakata, Eiji*; Seko, Noriaki; Tamada, Masao; Tateishi, Naoyuki*; Kogi, Yuichiro*; Mase, Atsushi*
no journal, ,
no abstracts in English
Ito, Naoki*; Kogi, Yuichiro*; Tateishi, Naoyuki*; Seko, Noriaki; Tamada, Masao; Sakata, Eiji*
no journal, ,
no abstracts in English
Ito, Naoki*; Mase, Atsushi*; Kogi, Yuichiro*; Sakata, Eiji*; Tamada, Masao; Seko, Noriaki
no journal, ,
no abstracts in English
