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Matsuo, Yoichiro*; Izumi, Yoshinobu*; Hase, Yoshihiro; Sakamoto, Ayako; Nozawa, Shigeki; Narumi, Issey*; Shimizu, Kikuo*
JAEA-Review 2013-059, JAEA Takasaki Annual Report 2012, P. 112, 2014/03
Hase, Yoshihiro; Nozawa, Shigeki; Asami, Itsuo*; Tanogashira, Yuki*; Matsuo, Yoichi*; Kanazawa, Akira*; Honda, Kazushige*; Narumi, Issey*
JAEA-Review 2013-059, JAEA Takasaki Annual Report 2012, P. 102, 2014/03
Oshima, Takeshi; Deki, Manato; Makino, Takahiro; Iwamoto, Naoya; Onoda, Shinobu; Hirao, Toshio*; Kojima, Kazutoshi*; Tomita, Takuro*; Matsuo, Shigeki*; Hashimoto, Shuichi*
AIP Conference Proceedings 1525, p.654 - 658, 2013/04
Times Cited Count:0 Percentile:0.05(Physics, Applied)Metal-Oxide-Semiconductor (MOS) capacitors were fabricated on n-type 4H-SiC epitaxial layers, and the leakage current through the gate oxide during heavy ion irradiation was investigated in order to evaluate dielectric breakdown induced by heavy ions (Single Event Gate Rupture: SEGR). The gate oxide at thickness ranges between 60 and 80 nm was formed using pyrogenic oxidation at 1100 C for 60 min. Circular electrodes with 180 diameter were formed using Al evaporation and a lift-off technique. The leakage current observed through the gate oxide was monitored during 18 MeV oxygen (O) or nickel (Ni) ions. As a result, although no significant difference in the value of the electric field at the dielectric breakdown (around 8.2 MV/cm) was observed between non-irradiated and 18 MeV-O irradiated samples, the value decreased to be 7.3 MV/cm in the case of 18 MeV-Ni ion incidence. The Linier Energy Transfer (LET) for 18 MeV-O is 7 MeV cm/mg, and this value is smaller than that for 18 MeV-Ni (24 MeV cm/mg). Also, 18 MeV-Ni ions deposit energy in narrower regions than 18 MeV-O ions. Thus, it can be concluded that the high density of charge induced by 18 MeV-Ni ions triggers SEGR in SiC MOS capacitors.
Hase, Yoshihiro; Nozawa, Shigeki; Okada, Tomoyuki*; Asami, Itsuo*; Nagatani, Takeshi*; Matsuo, Yoichi*; Kanazawa, Akira*; Honda, Kazushige*; Narumi, Issei
JAEA-Review 2012-046, JAEA Takasaki Annual Report 2011, P. 95, 2013/01
Matsuo, Yoichiro*; Izumi, Yoshinobu*; Hase, Yoshihiro; Sakamoto, Ayako; Nozawa, Shigeki; Narumi, Issei; Shimizu, Kikuo*
JAEA-Review 2012-046, JAEA Takasaki Annual Report 2011, P. 105, 2013/01
Hase, Yoshihiro; Nozawa, Shigeki; Okada, Tomoyuki*; Asami, Itsuo*; Nagatani, Takeshi*; Matsuo, Yoichi*; Kanazawa, Akira*; Honda, Kazushige*; Narumi, Issei
JAEA-Review 2011-043, JAEA Takasaki Annual Report 2010, P. 100, 2012/01
Matsuo, Yoichiro*; Izumi, Yoshinobu*; Hase, Yoshihiro; Sakamoto, Ayako; Nozawa, Shigeki; Narumi, Issei; Shimizu, Kikuo*
JAEA-Review 2011-043, JAEA Takasaki Annual Report 2010, P. 108, 2012/01
Ito, Takuto*; Deki, Manato; Tomita, Takuro*; Matsuo, Shigeki*; Hashimoto, Shuichi*; Kitada, Takahiro*; Isu, Toshiro*; Onoda, Shinobu; Oshima, Takeshi
Proceedings of 12th International Symposium on Laser Precision Microfabrication (LPM 2011) (Internet), 5 Pages, 2011/06
Uchida, Masaki*; Oishi, Koji*; Matsuo, Mari; Koshibae, Wataru*; Onose, Yoshinori*; Mori, Michiyasu; Fujioka, Jun*; Miyasaka, Shigeki*; Maekawa, Sadamichi; Tokura, Yoshinori*
Physical Review B, 83(16), p.165127_1 - 165127_5, 2011/04
Times Cited Count:30 Percentile:74.51(Materials Science, Multidisciplinary)Deki, Manato; Ito, Takuto*; Yamamoto, Minoru*; Tomita, Takuro*; Matsuo, Shigeki*; Hashimoto, Shuichi*; Kitada, Takahiro*; Isu, Toshiro*; Onoda, Shinobu; Oshima, Takeshi
Applied Physics Letters, 98(13), p.133104_1 - 133104_3, 2011/03
Times Cited Count:13 Percentile:49.19(Physics, Applied)Matsuo, Yoichi*; Hase, Yoshihiro; Nozawa, Shigeki; Yoshihara, Ryohei; Narumi, Issei
JAEA-Review 2010-065, JAEA Takasaki Annual Report 2009, P. 66, 2011/01
no abstracts in English
Shimizu, Kikuo*; Matsuo, Yoichiro*; Izumi, Yoshinobu*; Hase, Yoshihiro; Nozawa, Shigeki; Sakamoto, Ayako; Narumi, Issei
JAEA-Review 2010-065, JAEA Takasaki Annual Report 2009, P. 79, 2011/01
Deki, Manato; Ito, Takuto*; Tomita, Takuro*; Matsuo, Shigeki*; Hashimoto, Shuichi*; Kitada, Takahiro*; Isu, Toshiro*; Onoda, Shinobu; Oshima, Takeshi
Proceedings of 9th International Workshop on Radiation Effects on Semiconductor Devices for Space Applications (RASEDA-9), p.218 - 221, 2010/10
Tomita, Takuro*; Iwami, Masahiro*; Yamamoto, Minoru*; Deki, Manato*; Matsuo, Shigeki*; Hashimoto, Shuichi*; Nakagawa, Yoshinori*; Kitada, Takahiro*; Isu, Toshiro*; Saito, Shingo*; et al.
Materials Science Forum, 645-648, p.239 - 242, 2010/04
no abstracts in English
Matsuo, Yoichiro*; Nishijima, Shigehiro*; Hase, Yoshihiro; Nozawa, Shigeki; Sakamoto, Ayako; Narumi, Issei; Shimizu, Kikuo*
JAEA-Review 2009-041, JAEA Takasaki Annual Report 2008, P. 75, 2009/12
no abstracts in English
Matsuo, Yoichi*; Hase, Yoshihiro; Nozawa, Shigeki; Yoshihara, Ryohei; Narumi, Issei
JAEA-Review 2009-041, JAEA Takasaki Annual Report 2008, P. 76, 2009/12
no abstracts in English
Matsuo, Yoichi*; Hase, Yoshihiro; Nozawa, Shigeki; Yoshihara, Ryohei; Yokota, Yuichiro; Narumi, Issei; Oyabu, Eiko*
no journal, ,
no abstracts in English
Deki, Manato*; Ito, Takuto*; Yamamoto, Minoru*; Tomita, Takuro*; Matsuo, Shigeki*; Hashimoto, Shuichi*; Kitada, Takahiro*; Isu, Toshiro*; Onoda, Shinobu; Oshima, Takeshi
no journal, ,
no abstracts in English
Deki, Manato; Yamamoto, Minoru*; Ito, Takuto*; Tomita, Takuro*; Matsuo, Shigeki*; Hashimoto, Shuichi*; Kitada, Takahiro*; Isu, Toshiro*; Onoda, Shinobu; Oshima, Takeshi
no journal, ,
no abstracts in English
Tsukui, Narutaka; Watanabe, Shigeki; Yamada, Keiichi*; Hanaoka, Hirofumi*; Oku, Hiroyuki*; Matsuo, Ichiro*; Endo, Keigo*; Ishioka, Noriko
no journal, ,
no abstracts in English