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Development of an ion beam brightness measurement system based on luminescence for formation of MeV ion nanobeams

MeVイオンナノビームを形成するための発光を利用した輝度測定計の開発

石井 保行; 千葉 敦也; 横山 彰人; 上松 敬; 神谷 富裕; 水橋 清

Ishii, Yasuyuki; Chiba, Atsuya; Yokoyama, Akihito; Agematsu, Takashi; Kamiya, Tomihiro; Mizuhashi, Kiyoshi

The measurement of the ion beam brightness is of importance to form ion nanobeams by increasing the beam current at a focusing point. The ion beam brightness has, so far, been generally measured by moving two-dimensional slits in x- and y- directions separately. A new brightness measurement system consists of a thin Cu slit with small uniform multi holes, a luminous material target moving in the beam direction and a high-sensitive CCD camera. The system is connected to a beam line of the single-ended type electrostatic accelerator at JAEA. The ion beams passing through the slit are projected on the luminous material. The two images of the multi luminous circles are taken at two positions separated several hundred mm by the direction of a beam axis using the CCD camera. The system has an advantage of accurately measuring the divergence angle by changing their luminous sizes of the holes. The brightness is evaluated by estimating the beam divergence angles from comparing the two separated images with the different luminous circle sizes. The measurement results of the ion beam brightness in the beam energy range from 1 MeV to 3 MeV will be described in the paper.

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