Design, fabrication and transportation of Si rotating device
Kimura, Nobuaki ; Imaizumi, Tomomi; Takemoto, Noriyuki ; Tanimoto, Masataka ; Saito, Takashi; Hori, Naohiko ; Tsuchiya, Kunihiko ; Romanova, N. K.*; Gizatulin, S.*; Martyushov, A.*; Nakipov, D.*; Chakrov, P.*; Tanaka, Futoshi*; Nakajima, Takeshi*
Si semiconductor production by Neutron Transmutation Doping (NTD) method using the Japan Materials Testing Reactor (JMTR) has been investigated in Neutron Irradiation and Testing Reactor Center, Japan Atomic Energy Agency (JAEA) in order to expand industry use. As a part of investigations, irradiation test of silicon ingot for development of NTD-Si with high quality was planned using WWR-K in Institute of Nuclear Physics (INP), National Nuclear Center of Republic of Kazakhstan (NNC-RK) based on one of specific topics of cooperation (STC), Irradiation Technology for NTD-Si (STC No.II-4), on the implementing arrangement between NNC-RK and the JAEA for "Nuclear Technology on Testing/Research Reactors" in cooperation in research and development in nuclear energy and technology. As for the irradiation test, Si rotating device was fabricated in JAEA, and the fabricated device was transported with irradiation specimens from JAEA to INP-NNC-RK. This report described the design, the fabrication, the performance test of the Si rotating device and transportation procedures.