Benomyl-tolerant mutation of entomopathogenic fungi induced by carbon ion beams

Saito, Tsutomu*; Shinohara, Shinobu*; Sato, Katsuya; Narumi, Issei

Entomopathogenic fungi, and , are important agents to control insect pests, but the fungi are highly susceptible to conventional fungicides for plant diseases such as powdery mildew. The purpose of this study is to generate mutants tolerant to benomyl, a major fungicide, using carbon ion beams. We have obtained some benomyl-tolerant mutants that were selected on medium supplemented with the fungicide (1,000 ppm). In this study, IC (half maximal inhibitory concentration) of benomyl was determined for the mutants obtained. It is suggested that the fungicide-tolerant mutants maintained a high virulence serve as highly potential biological control agents in integrated pest management programs.