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Power supply of the pulse steering magnet for changing the painting area between the MLF and the MR at J-PARC 3 GeV RCS

J-PARC 3GeV RCSにおけるMLFとMRのペインティングエリアを切り替えるパルス偏向電磁石用電源

高柳 智弘; 林 直樹; 植野 智晶; 堀野 光喜; 富樫 智人; 金正 倫計; 渡辺 泰広; 入江 吉郎*

Takayanagi, Tomohiro; Hayashi, Naoki; Ueno, Tomoaki; Horino, Koki; Togashi, Tomohito; Kinsho, Michikazu; Watanabe, Yasuhiro; Irie, Yoshiro*

可変偏向電磁石用の電源を製作した。電源は、パルスと直流を、ビームユーザーズのためのペインティング入射とビームコミッショニングのためのセンター入射の二つのモードに対応して、パルスと直流を出力する機能を備えている。パルス電源は、設定値に対して$$pm$$0.2%の偏差を、直流電源は、$$pm$$0.01%以下のリプル電流が要求され、これらの性能を満足することを確認した。電源の設計と測定結果を述べる。

The power supply of the pulse steering magnet has been produced. The power supply has the equipment used to excite the pulse current and the direct-current (DC) to correspond to two modes that the painting injection for beam users and the central injection for beam commissioning. The pulse current has been performed with good accuracy whose deviation to a setting current becomes to be less than 0.2%. In case of the central injection, the power supply excites the current in DC mode, which has been realized the ripple current below 0.01%. This paper describes the design parameters and the experimental results of the power supply.

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