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Fabrication of neutron optical devices using PBW technique

PBW技術による中性子用光学素子の作製

酒井 卓郎; 飯倉 寛; 山田 尚人*; 佐藤 隆博*; 石井 保行*; 内田 正哉*

Sakai, Takuro; Iikura, Hiroshi; Yamada, Naoto*; Sato, Takahiro*; Ishii, Yasuyuki*; Uchida, Masaya*

In this work, we report on the application of a UV/EB curable resin, in proton beam writing (PBW) for the fabrication of fine neutron optics devices. The resin is a liquid at room temperature; therefore, it mixes easily with functional materials, such as neutron absorbers. However, 20-30 $$mu$$m thick neutron absorber must be required as the grating materials. So PBW is a promising technique to fabricate the neutron devices. The fabrication process is similar to lithography. The neutron absorber is gadolinium oxide (Gd$$_{2}$$O$$_{3}$$). Pattern exposures are performed using 3 MeV proton beams approximately 1 $$mu$$m in diameter. The irradiated areas are quickly cured by polymerization. The fabricated gratings were observed using an optical microscope. The microscopic images show that the patterns of the fabricated structures agree well with the original one. In addition, a lateral direction of the sample was observed using the scanning electron microscope (SEM). The thickness of the sample is approximately 35 $$mu$$m. In conclusion, the fabrication of grating structures is successful and the results also proved that the UV/EB curable resin is very promising material for use in PBW micromachining.

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