Soft X-ray irradiation induced metallization of layered TiNCl

層状TiNClの軟X線照射による金属化

Kataoka, Noriyuki*; Tanaka, Masashi*; Hosoda, Wataru*; Taniguchi, Takumi*; 藤森 伸一   ; Wakita, Takanori*; Muraoka, Yuji*; Yokoya, Takashi*

Kataoka, Noriyuki*; Tanaka, Masashi*; Hosoda, Wataru*; Taniguchi, Takumi*; Fujimori, Shinichi; Wakita, Takanori*; Muraoka, Yuji*; Yokoya, Takashi*

We have performed soft X-ray spectroscopy in order to study thephotoirradiation time dependence of the valence band structure and chemicalstates of layered transition metal nitride chloride TiNCl. Under the soft X-ray irradiation, the intensities of the states near the Fermi level ()and the Ti component increased, while the Cl 2 intensity decreased. Ti2-3 resonance photoemission spectroscopy confirmed a distinctive Fermiedge with Ti 3 character. These results indicate the photo-inducedmetallization originates from deintercalation due to Cl desorption, and thusprovide a new carrier doping method that controls the conducting propertiesof TiNCl.