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Soft X-ray irradiation induced metallization of layered TiNCl

層状TiNClの軟X線照射による金属化

Kataoka, Noriyuki*; Tanaka, Masashi*; Hosoda, Wataru*; Taniguchi, Takumi*; 藤森 伸一; Wakita, Takanori*; Muraoka, Yuji*; Yokoya, Takashi*

Kataoka, Noriyuki*; Tanaka, Masashi*; Hosoda, Wataru*; Taniguchi, Takumi*; Fujimori, Shinichi; Wakita, Takanori*; Muraoka, Yuji*; Yokoya, Takashi*

We have performed soft X-ray spectroscopy in order to study thephotoirradiation time dependence of the valence band structure and chemicalstates of layered transition metal nitride chloride TiNCl. Under the soft X-ray irradiation, the intensities of the states near the Fermi level ($$E_{rm F}$$)and the Ti$$^{3+}$$ component increased, while the Cl 2$$p$$ intensity decreased. Ti2$$p$$-3$$d$$ resonance photoemission spectroscopy confirmed a distinctive Fermiedge with Ti 3$$d$$ character. These results indicate the photo-inducedmetallization originates from deintercalation due to Cl desorption, and thusprovide a new carrier doping method that controls the conducting propertiesof TiNCl.

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パーセンタイル:100

分野:Physics, Condensed Matter

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