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In situ neutron reflectometry analysis of interfacial structure formation between phenolic resin and silica during curing

中性子反射率によるフェノール樹脂-シリカ界面における構造形成過程の解析

和泉 篤士*; 首藤 靖幸*; 柴山 充弘*; 宮田 登*; 宮崎 司*; 青木 裕之  

Izumi, Atsushi*; Shudo, Yasuyuki*; Shibayama, Mitsuhiro*; Miyata, Noboru*; Miyazaki, Tsukasa*; Aoki, Hiroyuki

The structural formation mechanism of phenolic resin-silica interfaces was investigated in situ by neutron reflectometry during curing. There was a 4 nm thick novolac resin adsorption layer on the silica surface before curing. The curing reaction of the novolac resin with hexamethylenetetramine (HMTA) increased the coherent neutron scattering length density of the resin due to the cure shrinkage accompanied by the volatilization of ammonia, which is a byproduct of HMTA decomposition. As curing proceeded at 180$$^{circ}$$C, the thickness of the bulk layer increased despite the cure shrinkage, and the thickness of the interfacial layer decreased from 4 to 1 nm. This is attributed to the diffusion of decomposed HMTA fragments generated in the bulk layer into the interfacial novolac adsorption layer during diffusion throughout the bulk layer, incorporating the upper part of the interfacial layer reacting with the fragment into the bulk layer. On the other hand, the fragments could not diffuse into the tightly bound immobile segments of novolac resin in direct contact with the silica surface, retaining the 1-2 nm thick interfacial layer in the cured resin. This structural formation mechanism caused interfacial cross-link inhomogeneity in the cured resin on the silica surface.

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パーセンタイル:52.63

分野:Chemistry, Multidisciplinary

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