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Fabrication of enzyme-degradable and size-controlled protein nanowires using single particle nano-fabrication technique

大道 正明*; 麻野 敦資*; 佃 諭志*; 高野 勝昌*; 杉本 雅樹; 佐伯 昭紀*; 酒巻 大輔*; 小野田 晃*; 林 高史*; 関 修平*

Nature Communications (Internet), 5, p.3718_1 - 3718_8, 2014/04

 被引用回数:31 パーセンタイル:16.08(Multidisciplinary Sciences)



Visualization of a single cluster particle track in polystyrene films

麻野 敦資*; 高野 勝昌*; 千葉 敦也; 齋藤 勇一; 丸井 裕美*; 大道 正明*; 前吉 雄太*; 本庄 義人*; 佐伯 昭紀*; 山田 圭介; et al.

JAEA-Review 2012-046, JAEA Takasaki Annual Report 2011, P. 163, 2013/01

In this study, a visualization of the tracks of fragments from a dissociated cluster ion in a target was tried using polystyrene derivatives with higher sensitivity for the ion beam irradiation. The results were compared with the case of ion beam consisting of single ion, considering the feature of cluster beam irradiation. The ion species were selected to be $$^{12}$$C$$_{4}$$$$^{+}$$ and $$^{48}$$Ti$$^{+}$$. As a result, the density of the structures at the $$^{48}$$Ti$$^{+}$$ beam irradiation was almost the same to the ion fluence. However, the density at the $$^{12}$$C$$_{4}$$$$^{+}$$ irradiation was much less than the ion fluence. It is supposed that many cluster particles are fragmentized during penetration in the polymer film. The radial dose distribution inside a particle tracks is decreased, and then the cross-linking reaction is induced insufficiently. In order to visualize the tracks of the fragmentation, optimization of the development or selection of materials with higher sensitivity should be needed.


Visualization of focused proton beam dose distribution by atomic force microscopy using blended polymer films based on polyacrylic acid

大道 正明*; 高野 勝昌*; 佐藤 隆博; 神谷 富裕; 石井 保行; 大久保 猛; 江夏 昌志; 加田 渉; 杉本 雅樹; 西川 宏之*; et al.

Journal of Nanoscience and Nanotechnology, 12, p.7401 - 7404, 2012/09

 被引用回数:2 パーセンタイル:86.39(Chemistry, Multidisciplinary)

A new visualization method for dose distribution of a focused proton beam in sub-micrometer scale was developed using a formation of a bulky cross-linked structure of polyacrylic acid -$$N$$, $$N$$'-methylence bisacrylamide, blend film. The areas irradiated by the focused proton beam were swelled on the film. The height of the swelling was significantly increased according to the beam fluence and the increase of containing ratio of the methylence bisacrylamide. The height was saturated at the fluence of 5$$times$$10$$^5$$ ions/$$mu$$m$$^{2}$$. The proton beam-sensitive polymer film was used for the analysis of dose distribution on its surface. The irradiated surface was observed by employing an atomic force microscope. This observation result showed that the method could be used to confirm the writing patterns and the beam-spot shape. Nanostructures with a crescent shape are visualized clearly at a misaligned beam-spot shape in the set up of the beam-optics.


Fullerene nanowires as a versatile platform for organic electronics

前吉 雄太*; 佐伯 昭紀*; 諏訪 翔太郎*; 大道 正明*; 丸井 裕美*; 麻野 敦資*; 佃 諭志*; 杉本 雅樹; 岸村 顕広*; 片岡 一則*; et al.

Scientific Reports (Internet), 2, p.600_1 - 600_6, 2012/08

 被引用回数:41 パーセンタイル:22.98(Multidisciplinary Sciences)

高分子薄膜に入射するイオンの飛跡に沿って生じる高濃度活性種により直径ナノオーダーの架橋体を形成し、これを溶媒抽出する方法を用いて、フラーレン(C$$_{60}$$)やその誘導体である[6,6]phenyl C$$_{61}$$ butyric acid methyl ester (PC$$_{61}$$BM)のナノワイヤーの作製を試みた。C$$_{60}$$及びPC$$_{61}$$BMを0.1$$sim$$4$$mu$$mの厚さに成膜し、$$^{129}$$Xe$$^{23+}$$ 450MeVあるいは$$^{192}$$Os$$^{30+}$$ 490MeVイオンを照射した結果、半径8$$sim$$11nmのナノワイヤーの作製に成功した。また、有機半導体の原料であるポリチオフェンに、長さ120$$mu$$mのPC$$_{61}$$BMナノワイヤーを数密度1$$times$$10$$^{9}$$cm$$^{-1}$$で混合して試作した有機薄膜太陽電池は、ナノワイヤーを混合しない場合に比べて約7%変換効率が増大することを見いだした。これは、ポリチオフェン中に、PC$$_{61}$$BM分子が個々に分散しているよりも、ナノワイヤーとして混合する方が電子の移動度が大きくなるためと考えられる。微細加工が困難なフラーレン誘導体から、イオンビームを用いた技術によりナノワイヤーが作製可能で有り、これを有機薄膜太陽電池へ応用することで、変換効率が向上できることを実証できた。


Microprocessing of arched bridge structures with epoxy resin by proton beam writing

高野 勝昌*; 麻野 敦資*; 前吉 雄太*; 丸井 裕美*; 大道 正明*; 佐伯 昭紀*; 関 修平*; 佐藤 隆博; 石井 保行; 神谷 富裕; et al.

Journal of Photopolymer Science and Technology, 25(1), p.43 - 46, 2012/07

 被引用回数:2 パーセンタイル:91.53(Polymer Science)

The proton beam writing (PBW) with energy of several MeV ranges is a unique tool of three-dimensional microprocessing for a polymer material. Three-dimensional structures like a bridge structure can be fabricated by the double exposures of PBW with two deferent energies followed by the one-time development using etching solution. In this study, the fabrication of an arched bridge was attempted by means of the supercritical drying with liquid carbon dioxide to a SU-8 photoresist film, as the polymer material, coated on a substrate of epoxy sheet, after the PBW process. In the exposures, two patterns of bridge girders and piers were written with 0.5 and 3 MeV proton beams to the SU-8 photoresist films, respectively. After these writings, the photoresist films were developed with the solution of diacetone alcohol and rinsed with the solution of isopropyl alcohol. Then the supercritical drying with liquid carbon dioxide was used at 12 MPa, 40$$^{circ}$$C. As the results, the bridge structures with curved girders to the vertical direction were formed due to the swelling effect of the photoresist film on the drying. In the conference, the microprocessing method of the bridge structure and the swelling effect of the photoresist film will be represented in detail.


Fabrication of concave and convex structure array consisted of epoxy long-nanowires by light and heavy ion beams lithography

高野 勝昌*; 杉本 雅樹; 麻野 敦資*; 前吉 雄太*; 丸井 裕美*; 大道 正明*; 佐伯 昭紀*; 関 修平*; 佐藤 隆博; 石井 保行; et al.

Transactions of the Materials Research Society of Japan, 37(2), p.237 - 240, 2012/06

A three dimensional microfabrication technique for polymer films has been investigated on the basis of fabricating micrometer structures composed of the fine wire structures which were fabricated by the chemical reaction induced along ion tracks of heavy ions with the energy of hundred MeV. In this study, we propose a new hemispherical microfabrication technique of epoxy resin for the fabrication of optical lenses using two times irradiation technique combining proton beam writing and low fluence irradiation of heavy ion beam. At first, an epoxy resin films composed of an etching and a non-etching layers of epoxy resin were irradiated at a frame pattern using a 3 MeV focused proton beam. At second, the low fluence irradiation of 450 MeV $$^{129}$$Xe$$^{23+}$$ was performed by a raster line scanning with oblique angle of 45 degree. Finally, the non-irradiated area of the etching layer of the films were etched by the developer. The observation of the etched films showed that the dome-like structures arrayed with a grid were formed on the non-etching layer of the epoxy resin films. The more detailed observation showed that each dome was composed of the fine wire structures formed by cross-linking reactions induced along the $$^{129}$$Xe$$^{23+}$$ tracks. The domes are expected to function as optical condenser-lenses.


Fabrication of poly(9,9'-dioctylfluorene)-based nano- and microstructures by proton beam writing

前吉 雄太*; 高野 勝昌*; 麻野 敦資*; 丸井 裕美*; 大道 正明*; 佐藤 隆博; 神谷 富裕; 石井 保行; 大久保 猛; 江夏 昌志; et al.

Japanese Journal of Applied Physics, 51(4R), p.045201_1 - 045201_4, 2012/04

 被引用回数:1 パーセンタイル:94.61(Physics, Applied)

A relation between the fluence and the beam-induced chemical reaction in poly(9,9'-dioctylfluorene), PFO, films has been investigated to fabricate PFO-based nano-micro structures using Proton Beam Writing, PBW. In this investigation, we observed that the cross-linking reaction in PFO occurred without a cross-linking agent using PBW. Furthermore, not only the surface morphology but also structure and shape on PFO films were changed from nano-meter to micro-meter size by controlling the fluence of proton beam irradiation on the basis of the investigation. Consequently, the structure of the arabic numbers was successful fabricated as three-dimensional PFO structures with the aspect ratio of 12 at the fluence of 3.5 $$times$$ 10$$^6$$ ions/$$mu$$m$$^2$$ by PBW.


Three dimensional microprocessing for polymer films by mev ion beam lithography

高野 勝昌*; 麻野 敦資*; 前吉 雄太*; 丸井 裕美*; 大道 正明*; 佐伯 昭紀*; 関 修平*; 佐藤 隆博; 石井 保行; 神谷 富裕; et al.

no journal, , 

A three-dimensional micro-structure with upstanding nanowires was fabricated on the basis of the nano- and micro-processing technique developed as a new method of ion beam lithography employing a series of irradiations on epoxy films, (a) microbeam scanning with two different energies of a few MeV and (b) single heavy ion hits with several hundred MeV energy. Demonstration of fabricating a girder-bridge and pillars for support of upstanding nanowires was made as follows: the pattern of the girder-bridge and pillars was drawn using irradiation (a), the pattern on single-dots for nanowires was superimposed on the girder-bridge pattern using irradiation (b), and development of the irradiated sample by etching solution. The upstanding nanowires between the epoxy substrate and the girder bridge were successfully fabricated and observed using SEM.

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