Fabrication of concave and convex structure array consisted of epoxy long-nanowires by light and heavy ion beams lithography

軽・重イオンビームリソグラフィーによるエポキシ樹脂の長いナノワイヤーで構成された凹凸構造の製作

高野 勝昌*; 杉本 雅樹; 麻野 敦資*; 前吉 雄太*; 丸井 裕美*; 大道 正明*; 佐伯 昭紀*; 関 修平*; 佐藤 隆博; 石井 保行; 神谷 富裕; 大久保 猛; 江夏 昌志; 西川 宏之*

Takano, Katsuyoshi*; Sugimoto, Masaki; Asano, Atsushi*; Maeyoshi, Yuta*; Marui, Hiromi*; Omichi, Masaaki*; Saeki, Akinori*; Seki, Shu*; Sato, Takahiro; Ishii, Yasuyuki; Kamiya, Tomihiro; Okubo, Takeru; Koka, Masashi; Nishikawa, Hiroyuki*

A three dimensional microfabrication technique for polymer films has been investigated on the basis of fabricating micrometer structures composed of the fine wire structures which were fabricated by the chemical reaction induced along ion tracks of heavy ions with the energy of hundred MeV. In this study, we propose a new hemispherical microfabrication technique of epoxy resin for the fabrication of optical lenses using two times irradiation technique combining proton beam writing and low fluence irradiation of heavy ion beam. At first, an epoxy resin films composed of an etching and a non-etching layers of epoxy resin were irradiated at a frame pattern using a 3 MeV focused proton beam. At second, the low fluence irradiation of 450 MeV Xe was performed by a raster line scanning with oblique angle of 45 degree. Finally, the non-irradiated area of the etching layer of the films were etched by the developer. The observation of the etched films showed that the dome-like structures arrayed with a grid were formed on the non-etching layer of the epoxy resin films. The more detailed observation showed that each dome was composed of the fine wire structures formed by cross-linking reactions induced along the Xe tracks. The domes are expected to function as optical condenser-lenses.