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超音速酸素分子線を用いたSi(001)表面の高温酸化過程における化学反応ダイナミクス

Chemical reaction dynamics in oxidation processes of Si(001) surface at high temperature

寺岡 有殿; 吉越 章隆 ; 盛谷 浩右

Teraoka, Yuden; Yoshigoe, Akitaka; Moritani, Kosuke

Si(001)と酸素分子の高温における酸化反応の並進運動エネルギー効果について最近の研究成果を解説する。SiO分子の脱離収率の温度依存性,酸素の吸着曲線、及びシリコンの化学結合状態が並進運動エネルギーで変化することを述べる。酸化膜形成とSiO脱離が共存する化学反応過程に対する並進運動エネルギーの効果を議論する。

Recent research results on translational kinetic energy effects of incident oxygen molecules for Si(001) oxidation are summalized and introduced. The variation of surface temperature dependence of SiO desorption yield, oxygen uptake curves, and chemical bonding states depending on translational kinetic energy of oxygen molecules is described concretely. Eapecially, the translational kinetic energy effects on chemical reaction processes of concurrent oxide-layers formation and SiO desorption are discussed.

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