検索対象:     
報告書番号:
※ 半角英数字
 年 ~ 
 年

OPAL炉における照射技術の調査

Overview of irradiation technology in OPAL reactor

細川 甚作; 出雲 寛互; 石塚 悦男  

Hosokawa, Jinsaku; Izumo, Hironobu; Ishitsuka, Etsuo

JMTRに設置する新しい照射設備の技術開発に資するため、オーストラリアOPAL炉の医療用RI製造用$$^{99}$$Mo製造設備,シリコン半導体製造設備,気送管照射設備,RI取扱設備について調査した。本報告書は、これら照射設備について、設備の構造や安全設計の考え方等の調査結果をまとめたものである。

For the purpose of advanced technology developments on new irradiation facilities installed in the JMTR, the $$^{99}$$Mo production facility for medical RI, silicon semiconductor production facility, pneumatic irradiation facilities, RI handling facilities in the OPAL were investigated. In this paper, basic structure and the safety design concepts for these irradiation facilities are reported.

Access

:

- Accesses

InCites™

:

Altmetrics

:

[CLARIVATE ANALYTICS], [WEB OF SCIENCE], [HIGHLY CITED PAPER & CUP LOGO] and [HOT PAPER & FIRE LOGO] are trademarks of Clarivate Analytics, and/or its affiliated company or companies, and used herein by permission and/or license.