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Beam emittance control by changing injection painting area in a pulse-to-pulse mode in the 3-GeV rapid cycling synchrotron of Japan Proton Accelerator Research Complex

J-PARC 3GeV RCSにおけるパルス-パルスモードでの入射ペインティングエリア可変によるビームエミッタンスの制御

Saha, P. K.; 原田 寛之; 林 直樹; 堀野 光喜; 發知 英明; 金正 倫計; 高柳 智弘; 谷 教夫; 富樫 智人; 植野 智晶; 山崎 良雄; 入江 吉郎*

Saha, P. K.; Harada, Hiroyuki; Hayashi, Naoki; Horino, Koki; Hotchi, Hideaki; Kinsho, Michikazu; Takayanagi, Tomohiro; Tani, Norio; Togashi, Tomohito; Ueno, Tomoaki; Yamazaki, Yoshio; Irie, Yoshiro*

In order to ensure desired extracted beam emittances in a multi user high intensity proton synchrotron, a pulse-to-pulse direct control of the transverse injection painting area is proposed and also been verified through experimental studies in the 3-GeV RCS of J-PARC. The RCS has to ensure two different transverse sizes of the RCS extracted beam for the MLF and MR for 1 MW operation. For that purpose, we have designed and installed two pulse steering magnets in the RCS injection beam transport line and are used for changing injected beam trajectory for a smaller painting area for the MR. The measured extracted beam profile for the MR is found to be narrower as compared to that for MLF and is also quite consistent with corresponding numerical simulations. It is thus confirmed that in a multi user machine beam parameters can be dynamically controlled and delivered as requested by the users even in simultaneous operation.

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パーセンタイル:65.06

分野:Physics, Nuclear

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