A New eco-friendly synthesis method for arsenic adsorbent
環境に優しい水系合成法を用いたヒ素吸着材の開発
天田 春代; 高橋 牧克*; 保科 宏行; 瀬古 典明
Amada, Haruyo; Takahashi, Makikatsu*; Hoshina, Hiroyuki; Seko, Noriaki
A large amount of arsenic waste solution which was dissolved in neutral aqueous media, was generated from the manufacturing process of gallium arsenide component in semiconductor industry. As for arsenic removal, an adsorbent was developed by radiation graft polymerization and subsequent chemical modification with N-methyl-D-glucamine (NMDG) as a functional group. Furthermore, the grafting and the modification were carried out using water based solvent instead of organic solvent in view of an environmental emission and a working environment. The solvents were comprised of water and surfactant, and the adsorption performances compared with a conventional method synthesized in 1,4-dioxane of organic solvent. Total amount of arsenic for arsenic(III) and arsenic(V) at pH 6.5 were 3.2 times and 2.1 times higher than our previous fibrous adsorbent. From the pH dependency studies, the developed grafted adsorbent gave high removal ratio in a neutral media area for both arsenic species. Breakthrough capacities in the column mode tests for arsenic(III) and arsenic(V) were 0.3 and 18 mg/g at pH 6.5, respectively.