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Visible range photoluminescence from single photon sources in 3C, 4H and 6H silicon carbide

3C, 4H及び6H炭化ケイ素中の単一光子源からの可視光領域フォトルミネッセンス

Lohrmann, A.*; Castelletto, S.*; Klein, J. R.*; Bosi, M.*; Negri, M.*; Lau, D. W. M.*; Gibson, B. C.*; Prawer, S.*; McCallum, J. C.*; 大島 武; Johnson, B. C.*

Lohrmann, A.*; Castelletto, S.*; Klein, J. R.*; Bosi, M.*; Negri, M.*; Lau, D. W. M.*; Gibson, B. C.*; Prawer, S.*; McCallum, J. C.*; Oshima, Takeshi; Johnson, B. C.*

The single photon sources (SPSs) in the visible spectral region were fabricated near the surface of semi-insulating (SI) 4H-silicon carbide (SiC), SI 6H-SiC substrates and 3C-SiC epitaxial films by annealing in dry oxygen. The photoluminescence (PL) with high intensity was observed from samples after oxygen annealing above 550 $$^{circ}$$C although blinking characteristics of PL were observed from samples annealed below 550 $$^{circ}$$C. Also, the samples annealed above 550 $$^{circ}$$C showed blinking characteristics after removing oxygen atoms terminating the surface by HF-etching. Therefore, we can conclude that the oxygen termination is important to obtain stable PL characteristics from the SPSs near the surface of SiC.

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