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The Development of a non-destructive analysis system with negative muon beam for industrial devices at J-PARC MUSE

J-PARC MUSEにおける負ミュオンビームを用いた工業デバイス用非破壊分析システムの開発

反保 元伸*; 濱田 幸司*; 河村 成肇*; 稲垣 誠*; 伊藤 孝; 小嶋 健児*; 久保 謙哉*; 二宮 和彦*; Strasser, P.*; 吉田 剛*; 三宅 康博*

Tampo, Motonobu*; Hamada, Koji*; Kawamura, Naritoshi*; Inagaki, Makoto*; Ito, Takashi; Kojima, Kenji*; Kubo, Kenya*; Ninomiya, Kazuhiko*; Strasser, P.*; Yoshida, Go*; Miyake, Yasuhiro*

We developed a low-background muonic X-ray measurement system for nondestructive elemental depth-profiling analysis. A test experiment was performed using a multi-layered sample (34-$$mu$$m Al/140-$$mu$$m C/70-$$mu$$m Cu/500$$mu$$m LiF) and characteristic muonic X-rays from $$mu$$C, $$mu$$Cu, and $$mu$$F in the sample were successfully identified. A comparison was made between the relative intensity of the characteristic muonic X-rays and simulated muon depth profiles for several muon implantation energies.

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