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Detection of molecular oxygen adsorbate during room-temperature oxidation of Si(100)2$$times$$1 surface; In situ synchrotron radiation photoemission study

Si(100)2$$times$$1表面の室温酸化中の分子状酸素吸着種の検出; 放射光その場光電子分光研究

吉越 章隆 ; 山田 洋一*; 多賀 稜*; 小川 修一*; 高桑 雄二*

Yoshigoe, Akitaka; Yamada, Yoichi*; Taga, Ryo*; Ogawa, Shuichi*; Takakuwa, Yuji*

Si(100)2$$times$$1表面の室温酸化中の分子状吸着酸素を放射光光電子分光によって初めて検出することに成功した。O1sスペクトルはSi(111)7$$times$$7の場合と類似であった。分子状酸素は初期酸化物が生じた後に観測されたので、清浄表面上の解離酸素吸着に対する前駆状態でないことがわかった。この事実から我々は、2つのバックボンドにそれぞれ酸素原子をひとつずつ有する酸化Si原子上に分子状酸素が存在するとするモデルを提示する。

Synchrotron radiation photoelectron spectroscopy during the oxidation of the Si(100)2$$times$$1 surface at room temperature revealed the existence of the molecularly adsorbed oxygen, which was considered to be absent. The O 1s spectra was found to be similar to that of the oxidation of Si(111)7$$times$$7 surfaces. Also the molecular oxygen was appeared after the initial surface oxides, indicating that this was not a precursor for dissociation oxygen adsorption onto the clean surface. We have proposed presumable structural models for atomic configurations, where the molecular oxygen was resided on the oxidized silicon with two oxygen atoms at the backbonds.

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パーセンタイル:6.36

分野:Physics, Applied

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