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Hydrogen production tests by hydrogen iodide decomposition membrane reactor equipped with silica-based ceramics membrane

シリカ水素分離膜を用いたHI分解膜反応器による水素製造試験

Odtsetseg, M.; 田中 伸幸; 野村 幹弘*; 久保 真治

Odtsetseg, M.; Tanaka, Nobuyuki; Nomura, Mikihiro*; Kubo, Shinji

熱化学水素製造法ISプロセスにおいて水素生成する反応であるHI分解反応の分解率を向上させるため、水素分離膜を用いた膜反応器の適用を検討している。本研究では、高性能な水素分離膜を開発するため、HTMOSをシリカ源に用い$$alpha$$-アルミナ基材上に対向拡散CVD法を用いて製膜したシリカ膜の性能を調べた。$$alpha$$-アルミナに直接製膜した膜よりも$$gamma$$-アルミナをコーティングした$$alpha$$-アルミナ基材上に製膜した膜の方が、高い水素透過性を示すこと、および、450$$^{circ}$$Cの製膜条件で高い水素選択性ならびに水素透過性が得られることを見い出した。さらに、製膜した膜を適用した膜反応器において、HI分解反応を行い、平衡分解率(20%)を超える0.48の水素転化率を得ることができた。

The catalytic decomposition of hydrogen iodide in a membrane reactor using silica membranes derived from hexyltrimethoxysilane (HTMOS) was investigated for the production of hydrogen in the thermochemical water splitting iodine-sulfur process. The silica membranes were prepared by counter-diffusion chemical vapor deposition using porous alumina support tubes in both the absence and presence of a $$gamma$$-alumina layer. The silica membranes formed on $$gamma$$-alumina-coated $$alpha$$-alumina tubes displayed a higher H$$_{2}$$ permeance than that formed directly on an $$alpha$$-alumina tube. A silica membrane based on a 1.5 $$mu$$m-thick $$gamma$$-alumina layer fabricated under deposition conditions of 450$$^{circ}$$C, 1200 s, and a N$$_{2}$$ carrier gas velocity of 0.044 m s$$^{-1}$$ exhibited a high H$$_{2}$$ permeance of 9.4 $$times$$ 10$$^{-7}$$ mol Pa$$^{-1}$$ m$$^{-2}$$ s$$^{-1}$$ while maintaining an H$$_{2}$$/N$$_{2}$$ selectivity of over 80.0. The performance of a membrane reactor based on an HTMOS-derived silica membrane was evaluated at 400$$^{circ}$$C by measuring the HI conversion and H$$_{2}$$ flow rates. The conversion was approximately 0.48 when the HI flow rate was 9.7 mL min$$^{-1}$$.

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パーセンタイル:76.91

分野:Chemistry, Physical

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