Dissociative adsorption of supersonic CHCl on Cu oxide Surfaces; CuO(111) and bulk CuO precursor "29"; Structure on Cu(111)

Cu酸化物表面における超音速CHClの解離吸着; CuO(111)およびCu(111)上バルクCuO前駆体"29"; 構造

林田 紘輝*; 津田 泰孝   ; 村瀬 菜摘*; 山田 剛司*; 吉越 章隆 ; Dio, W. A.*; 岡田 美智雄*

Hayashida, Koki*; Tsuda, Yasutaka; Murase, Natsumi*; Yamada, Takashi*; Yoshigoe, Akitaka; Dio, W. A.*; Okada, Michio*

To examine the elementary steps of the Rochow-Mller process, we subjected copper oxides, viz., CuO(111) and the bulk CuO precursor "29" -structure on Cu(111), to supersonic molecular beams (SSMB) of CHCl. The SSMB energies range from 0.5-1.9 eV. We then employed X-ray photoemission spectroscopy (XPS) in conjunction with synchrotron radiation (SR) to determine the resulting adsorbed species present. We identified two reaction paths, viz., Reaction I and Reaction II, with one prevailing over the other depending on exposure conditions. Reaction I involves the dissociative adsorption of CHCl. In Reaction II, CHCl dissociates with Cl as the prevailing adsorbed species (higher than that of adsorbed carbonaceous species, as observed for Reaction I). For the incident energy and exposure conditions considered, we found Reaction II as the prevailing reaction path for CHCl reaction on both CuO(111) and the "29" -structure on Cu(111).