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Gasochromic coloration of non-stoichiometric WO$$_{rm 3-x}$$ films

不定比性WO$$_{rm 3-x}$$膜のガスクロミック着色

井上 愛知; 山本 春也; 永田 晋二*; 高野 勝昌; 吉川 正人; 四竈 樹男*

Inoue, Aichi; Yamamoto, Shunya; Nagata, Shinji*; Takano, Katsuyoshi; Yoshikawa, Masahito; Shikama, Tatsuo*

水素ガスと反応して着色する酸化タングステン膜による光学式水素センサーの開発を行うため、反応性マグネトロンスパッタ法を用いて不定比性酸化タングステン膜を作製し、その元素組成比と着色性能の関係を調べた。成膜雰囲気中のアルゴン分圧を150mPaに保ち、酸素分圧を0$$sim$$80mPaの範囲で変化させながら金属タングステンターゲットをスパッタして作製した試料に対して、ラザフォード後方散乱法(RBS)及び反跳粒子検出法(ERD)を用いて組成を調べた結果、膜の酸素組成比が増加するに伴って含有水素量は増加し、WO$$_{3}$$膜では最大約H$$_{0.7}$$WO$$_{3}$$まで水素が含有していることが明らかになった。また、石英基板上に同様な条件で堆積させた酸化タングステン膜表面に約15nmのパラジウムを堆積させた試料に対して着色性能を調べたところ、組成がWO$$_{3}$$に近づくほど、また含有水素が多いほど光の透過強度が低下する傾向にあった。

We investigated the gasochromic coloration of amorphous tungsten oxide films having compositions between WO$$_{0.25}$$ and WO$$_{3.0}$$. The films were deposited on SiO$$_{2}$$ or glassy carbon substrates by the reactive radio frequency (r. f.) magnetron sputtering with varying oxygen partial pressure. The oxygen and hydrogen concentration of the tungsten oxide films were determined using the Rutherford Backscattering Spectrometry (RBS) and the Elastic Recoil Detection Analysis (ERDA), respectively. The optical transmission was examined for the films coated with palladium catalysis during the exposure of diluted hydrogen gas. Superior gasochromic properties were obtained for the films consisting of tungsten trioxide WO$$_{3}$$. For the films with lower oxygen concentration than WO$$_{3}$$, the optical transmission hardly changed during the hydrogen exposure. A large concentration of hydrogen about 0.7 per a tungsten atom was found in the WO$$_{3}$$ films. The hydrogen retention drastically decreased with a decrease of the oxygen concentration.

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