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Soft-lithographic methods for the fabrication of dielectrophoretic devices using molds by proton beam writing

プロトン・ビーム・ライティングによる鋳型を使った誘電泳動デバイス製作のためのソフト・リソグラフィ方法

椎根 康晴*; 西川 宏之*; 古田 祐介*; 金光 薫*; 佐藤 隆博; 石井 保行; 神谷 富裕; 中尾 亮太*; 内田 諭*

Shiine, Yasuharu*; Nishikawa, Hiroyuki*; Furuta, Yusuke*; kanamitsu, Kaoru*; Sato, Takahiro; Ishii, Yasuyuki; Kamiya, Tomihiro; Nakao, Ryota*; Uchida, Satoshi*

Proton Beam Writing (PBW) is a direct writing process using a MeV focused proton beam. The previous performance examinations of the dielectrophoretic (DEP) devices, the high-aspect-ratio micro-structures with the pillar arrays and the fluidic channels fabricated by PBW, showed that spatially modulated electric fields were effective for trapping Escherichia coli. The reproduction of the DEP device using PBW only is, however, unsuitable because it takes a lot of time to fabricate complicated and large area structures. In this study, the fabrication technique of the micro fluidic channel, combining a soft lithography and PBW techniques, was introduced to improve the productivity of the DEP devices. The prototypes of DEP deceives including SU-8 high-aspect-ratio pillar arrays in the micro fluidic channel were developed using the fabrication technique. Especially the pillar arrays in these devices were produced by 1.0 or 1.7 MeV proton beams focused around 1 $$mu$$m in diameter. The observation of the DEP devices using an optical microscope image showed that the pillar arrays were successfully included in the micro fluidic channel. The prototyping capability of PBW combined with the soft lithography technique was highlighted by increasing the productivity of the DEP devices.

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パーセンタイル:63.67

分野:Engineering, Electrical & Electronic

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