Kinetic energy effects on initial sticking of O molecular beams on Ni(111) surface

Ni(111)表面でのO分子線の初期吸着確率に関する運動エネルギー効果

寺岡 有殿; 井上 敬介*; 川上 泰典*; 平谷 篤也*

Teraoka, Yuden; Inoue, Keisuke*; Kawakami, Yasunori*; Hiraya, Atsunari*

本研究ではNi(111)表面を超音速酸素分子線を用いて酸化し、放射光光電子分光で表面酸化状態を観察した。超音速酸素分子線照射と放射光光電子分光(SR-XPS)観察を繰り返した。照射から測定の一連の実験は室温下で行った。放射光のエネルギーは680eVとした。Ni2pとO1sの内殻光電子スペクトルを測定した。各運動エネルギーごとに初期吸着曲線を測定した。酸素分子の入射エネルギーが0.6eVから2.0eVの領域では、初期吸着確率は変化せず、2.0eVを超えると急激に増加した。2.0eVに吸着反応のしきい値が存在することを見いだした。

The oxidation states of Ni(111) surface, which were made by irradiation of supersonic O molecular beam (SSOMB), were analyzed by synchrotron radiation photoemission spectroscopy (SR-XPS). After irradiation of SSOMB on the Ni(111) surface to some extent, the evolution of surface oxides were observed by core level photoemission spectra of Ni2p and O1s using SR-XPS. The surface temperature was kept to be 300 K during SSOMB irradiation and SR-XPS measurements. The SR energy was 680 eV. Oxygen uptake curves were measured at every translational energy of O beam. Although the sticking probability was almost constant in the range of 0.6 eV to 2.0 eV, the remarkable increase was observed in the region over 2.0 eV. A threshold was found to be 2.0 eV.