検索対象:     
報告書番号:
※ 半角英数字
 年 ~ 
 年

Oxygen-induced reduction of the graphitization temperature of SiC surface

SiC表面の炭化温度の酸素誘起低温化

今泉 京*; 半田 浩之*; 高橋 良太*; 齋藤 英司*; 吹留 博一*; 遠田 義晴*; 寺岡 有殿; 吉越 章隆 ; 末光 眞希*

Imaizumi, Kei*; Handa, Hiroyuki*; Takahashi, Ryota*; Saito, Eiji*; Fukidome, Hirokazu*; Enta, Yoshiharu*; Teraoka, Yuden; Yoshigoe, Akitaka; Suemitsu, Maki*

In the solid-vapor phase equilibria between SiC and O$$_{2}$$ system, there exists a region where the reaction of O$$_{2}$$ with SiC takes place. By tuning the temperature and the oxygen pressure used in the graphitization annealing, we have succeeded in the growth of epitaxial graphene on SiC crystals at 1273 K, which is lower by 250$$^{circ}$$C or more than the conventional epitaxial graphene method. The method is especially useful to form an epitaxial graphene on a silicon substrate (GOS), which requires a lower graphitization temperature because of necessity of compatibility with conventional Si technologies.

Access

:

- Accesses

InCites™

:

パーセンタイル:20.9

分野:Physics, Applied

Altmetrics

:

[CLARIVATE ANALYTICS], [WEB OF SCIENCE], [HIGHLY CITED PAPER & CUP LOGO] and [HOT PAPER & FIRE LOGO] are trademarks of Clarivate Analytics, and/or its affiliated company or companies, and used herein by permission and/or license.