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Incubation time depending on surface temperature in Al(111) nitridation induced by kinetic energy of N$$_{2}$$

Al(111)表面でのN$$_{2}$$運動エネルギー誘起窒化におけるインキュベーション時間の表面温度依存性

神農 宗徹*; 寺岡 有殿; 高岡 毅*; Harries, J.; 吉越 章隆 ; 米田 忠弘*

Jinno, Muneaki*; Teraoka, Yuden; Takaoka, Tsuyoshi*; Harries, J.; Yoshigoe, Akitaka; Komeda, Tadahiro*

Alminium does not react with N$$_{2}$$ gas, but we found the direct nitridation of Al(111) at 473 K by using supersonic N$$_{2}$$ molecular beam. We analyzed the thin film by using synchrotron radiation photoemission spectroscopy. Photoemission measurements were conducted keeping surface temperature at 473 K, 373 K and 300 K. In the case of surface temperature at 300 K, the N1s photoemission peak was not observed until the N$$_{2}$$ dose of 1.0$$times$$10$$^{19}$$ molecules/cm$$^{2}$$. In the case of surface temperature at 473 K and 373 K, the N1s photoemission peak could be observed after the N$$_{2}$$ dose of 1.8$$times$$10$$^{16}$$ molecules/cm$$^{2}$$ and 2.4$$times$$10$$^{19}$$ molecules/cm$$^{2}$$, respectively. These results and depth profiling mean that the formation of adsorption precursors and controls the incubation time.

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