Time-evolution of thermal oxidation on high-index silicon surfaces; Real-time photoemission spectroscopic study with synchrotron radiation

シリコン高指数面の熱酸化の時間発展; 放射光を用いたリアルタイム光電子分光研究

大野 真也*; 井上 慧*; 森本 真弘*; 新江 定憲*; 豊島 弘明*; 吉越 章隆 ; 寺岡 有殿; 尾形 祥一*; 安田 哲二*; 田中 正俊*

Ono, Shinya*; Inoue, Kei*; Morimoto, Masahiro*; Arae, Sadanori*; Toyoshima, Hiroaki*; Yoshigoe, Akitaka; Teraoka, Yuden; Ogata, Shoichi*; Yasuda, Tetsuji*; Tanaka, Masatoshi*

The initial oxidation on high-index silicon surfaces with (113) and (120) orientations at 820 K has been investigated by real-time X-ray photoemission spectroscopy (Si 2p and O 1s) using 687 eV photons. The time evolutions of the Si (n=1-4) components in the Si 2p spectrum indicate that the Si state is suppressed on high-index surfaces compared with Si(001). The O 1s state consists of two components, a low-binding-energy component (LBC) and a high-binding-energy component (HBC). It is suggested that the O atom in strained Si-O-Si contributes to the LBC component. The reaction rates are slower on high-index surfaces compared with that on Si(001).