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Effect of water vapor and hydrogen treatments on the surface structure of Ni$$_{3}$$Al foil

Ni$$_{3}$$Alフォイルの表面構造に関する水蒸気および水素処理の効果

Xu, Y.*; Ma, Y.*; 櫻井 惇也*; 寺岡 有殿; 吉越 章隆; 出村 雅彦*; 平野 敏幸*

Xu, Y.*; Ma, Y.*; Sakurai, Junya*; Teraoka, Yuden; Yoshigoe, Akitaka; Demura, Masahiko*; Hirano, Toshiyuki*

The Ni$$_{3}$$Al foils were heat treated in water vapor at 873 K for 1 h followed by H$$_{2}$$ reduction at 873 K for 1 h. The effects of the water vapor treatment and the H$$_{2}$$ reduction on the surface structure of the Ni$$_{3}$$Al foils were investigated by means of scanning electron microscopy and synchrotron radiation X-ray photoemission spectroscopy. Both Ni and Al were oxidized during the water vapor treatment; fine NiO particles were formed on the surface, accompanied by the formation of Al(OH)$$_{3}$$ and NiAl$$_{2}$$O$$_{4}$$/Al$$_{2}$$O$$_{3}$$. The NiO particles were reduced to metallic Ni and the Al(OH)$$_{3}$$ was decomposed to Al$$_{2}$$O$$_{3}$$, whereas the NiAl$$_{2}$$O$$_{4}$$ and Al$$_{2}$$O$$_{3}$$ remained unchanged during the H$$_{2}$$ reduction, forming a Ni-enriched porous structure on the surface layer of NiAl$$_{2}$$O$$_{4}$$/ Al$$_{2}$$O$$_{3}$$.

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パーセンタイル:59.31

分野:Chemistry, Physical

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