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Pulse-by-pulse switching of operational parameters in J-PARC 3-GeV RCS

J-PARC 3GeV陽子シンクロトロンにおける運転パラメータのパルス毎切り替え

發知 英明; 渡辺 泰広; 原田 寛之; 岡部 晃大; Saha, P. K.; 菖蒲田 義博; 田村 文彦 ; 吉本 政弘

Hotchi, Hideaki; Watanabe, Yasuhiro; Harada, Hiroyuki; Okabe, Kota; Saha, P. K.; Shobuda, Yoshihiro; Tamura, Fumihiko; Yoshimoto, Masahiro

The J-PARC 3-GeV RCS (rapid cycling synchrotron) provides a high-power beam to both the MLF (materials and life science experimental facility) and the MR (main ring synchrotron) by switching the beam destination pulse by pulse. The beam properties required from the MLF and the MR are different; the MLF needs a wide-emittance beam with less charge density, while the MR requires a low-emittance beam with less beam halo. To meet such conflicting requirements while keeping beam loss within acceptable levels, the RCS has recently introduced a pulse-by-pulse switching of the operational parameters (injection painting emittance, chromaticity and betatron tune.) This paper reports such recent efforts toward the performance upgrade of the RCS including the successful beam tuning results for the parameter switching.

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