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Revising the 4${it f}$ symmetry in CeCu$$_{2}$$Ge$$_{2}$$; Soft X-ray absorption and hard X-ray photoemission spectroscopy

荒谷 秀和*; 中谷 泰博*; 藤原 秀紀*; 川田 萌樹*; 金井 惟奈*; 山神 光平*; 藤岡 修平*; 濱本 諭*; 久我 健太郎*; 木須 孝幸*; et al.

Physical Review B, 98(12), p.121113_1 - 121113_6, 2018/09


 被引用回数:3 パーセンタイル:63.29(Materials Science, Multidisciplinary)

We present a detailed study on the $$4f$$ ground state symmetry of the pressure-induced superconductor CeCu$$_2$$Ge$$_2$$ probed by soft X-ray absorption and hard X-ray photoemission spectroscopy. The revised Ce $$4f$$ ground states are determined as $$|{Gamma_7}rangle=sqrt{0.45}|{J_{z}=pm frac{5}{2}}rangle - sqrt{0.55}|{mp frac{3}{2}}rangle$$ with $$Sigmamathchar`-{rm type}$$ in-plane rotational symmetry. This gives an in-plane magnetic moment consistent with the antiferromagnetic moment as reported in neutron measurements. Since the in-plane symmetry is the same as that for the superconductor CeCu$$_2$$Si$$_2$$, we propose that the charge distribution along the $$c$$-axis plays an essential role in driving the system into a superconducting phase.


Electronic structure and magnetic properties of the half-metallic ferrimagnet Mn$$_{2}$$VAl probed by soft X-ray spectroscopies

永井 浩大*; 藤原 秀紀*; 荒谷 秀和*; 藤岡 修平*; 右衛門佐 寛*; 中谷 泰博*; 木須 孝幸*; 関山 明*; 黒田 文彬*; 藤井 将*; et al.

Physical Review B, 97(3), p.035143_1 - 035143_8, 2018/01


 被引用回数:5 パーセンタイル:53.96(Materials Science, Multidisciplinary)

フェリ磁性体Mn$$_{2}$$VAl単結晶の電子構造を軟X線吸収磁気円二色性(XMCD)、軟X線共鳴非弾性散乱(RIX)によって調べた。全ての構成元素のXMCD信号を観測した。Mn L$$_{2,3}$$ XMCDの結果は、密度汎関数理論を基にしたスペクトル計算により再現でき、Mn 3$$d$$状態の遍歴的性質が明らかとなった。V L$$_{2,3}$$XMCDの結果はイオンモデル計算によって定性的に説明され、V 3$$d$$電子はかなり局在的である。この描像は、V L$$_{3}$$ RIXSで明らかとなった局所的な$$dd$$遷移と矛盾しない。


Fabrication of Pt nanoparticle incorporated polymer nanowires by high energy ion and electron beam irradiation

佃 諭志*; 高橋 亮太*; 関 修平*; 杉本 雅樹; 出崎 亮; 吉川 正人; 田中 俊一郎*

Radiation Physics and Chemistry, 118, p.16 - 20, 2016/01

 被引用回数:1 パーセンタイル:82.75(Chemistry, Physical)

ヘキサクロロ白金(IV)酸を添加したポリビニルピロリドン(PVP)薄膜に高エネルギーイオンビームを照射することによってPVP-Ptナノ粒子ハイブリッドナノワイヤを作製した。一個のイオンを照射するとその飛跡に沿って、PVPの架橋反応とPt $$^{4+}$$の還元反応によるPt粒子の析出が同時に起こるため、現像処理後、基板にPtナノ粒子を包含するPVPナノワイヤを得ることができた。ヘキサクロロ白金(IV)酸の添加量を増加するとナノワイヤの直径が減少し、ナノワイヤの単離が困難となることが明らかになったが、イオン照射後、電子線を照射することによってナノワイヤの直径の制御およびナノワイヤの単離が可能であることを見出した。


Fabrication of enzyme-degradable and size-controlled protein nanowires using single particle nano-fabrication technique

大道 正明*; 麻野 敦資*; 佃 諭志*; 高野 勝昌*; 杉本 雅樹; 佐伯 昭紀*; 酒巻 大輔*; 小野田 晃*; 林 高史*; 関 修平*

Nature Communications (Internet), 5, p.3718_1 - 3718_8, 2014/04

 被引用回数:31 パーセンタイル:15.79(Multidisciplinary Sciences)



Visualization of a single cluster particle track in polystyrene films

麻野 敦資*; 高野 勝昌*; 千葉 敦也; 齋藤 勇一; 丸井 裕美*; 大道 正明*; 前吉 雄太*; 本庄 義人*; 佐伯 昭紀*; 山田 圭介; et al.

JAEA-Review 2012-046, JAEA Takasaki Annual Report 2011, P. 163, 2013/01

In this study, a visualization of the tracks of fragments from a dissociated cluster ion in a target was tried using polystyrene derivatives with higher sensitivity for the ion beam irradiation. The results were compared with the case of ion beam consisting of single ion, considering the feature of cluster beam irradiation. The ion species were selected to be $$^{12}$$C$$_{4}$$$$^{+}$$ and $$^{48}$$Ti$$^{+}$$. As a result, the density of the structures at the $$^{48}$$Ti$$^{+}$$ beam irradiation was almost the same to the ion fluence. However, the density at the $$^{12}$$C$$_{4}$$$$^{+}$$ irradiation was much less than the ion fluence. It is supposed that many cluster particles are fragmentized during penetration in the polymer film. The radial dose distribution inside a particle tracks is decreased, and then the cross-linking reaction is induced insufficiently. In order to visualize the tracks of the fragmentation, optimization of the development or selection of materials with higher sensitivity should be needed.


Visualization of focused proton beam dose distribution by atomic force microscopy using blended polymer films based on polyacrylic acid

大道 正明*; 高野 勝昌*; 佐藤 隆博; 神谷 富裕; 石井 保行; 大久保 猛; 江夏 昌志; 加田 渉; 杉本 雅樹; 西川 宏之*; et al.

Journal of Nanoscience and Nanotechnology, 12, p.7401 - 7404, 2012/09

 被引用回数:2 パーセンタイル:86.35(Chemistry, Multidisciplinary)

A new visualization method for dose distribution of a focused proton beam in sub-micrometer scale was developed using a formation of a bulky cross-linked structure of polyacrylic acid -$$N$$, $$N$$'-methylence bisacrylamide, blend film. The areas irradiated by the focused proton beam were swelled on the film. The height of the swelling was significantly increased according to the beam fluence and the increase of containing ratio of the methylence bisacrylamide. The height was saturated at the fluence of 5$$times$$10$$^5$$ ions/$$mu$$m$$^{2}$$. The proton beam-sensitive polymer film was used for the analysis of dose distribution on its surface. The irradiated surface was observed by employing an atomic force microscope. This observation result showed that the method could be used to confirm the writing patterns and the beam-spot shape. Nanostructures with a crescent shape are visualized clearly at a misaligned beam-spot shape in the set up of the beam-optics.


Fullerene nanowires as a versatile platform for organic electronics

前吉 雄太*; 佐伯 昭紀*; 諏訪 翔太郎*; 大道 正明*; 丸井 裕美*; 麻野 敦資*; 佃 諭志*; 杉本 雅樹; 岸村 顕広*; 片岡 一則*; et al.

Scientific Reports (Internet), 2, p.600_1 - 600_6, 2012/08

 被引用回数:41 パーセンタイル:22.74(Multidisciplinary Sciences)

高分子薄膜に入射するイオンの飛跡に沿って生じる高濃度活性種により直径ナノオーダーの架橋体を形成し、これを溶媒抽出する方法を用いて、フラーレン(C$$_{60}$$)やその誘導体である[6,6]phenyl C$$_{61}$$ butyric acid methyl ester (PC$$_{61}$$BM)のナノワイヤーの作製を試みた。C$$_{60}$$及びPC$$_{61}$$BMを0.1$$sim$$4$$mu$$mの厚さに成膜し、$$^{129}$$Xe$$^{23+}$$ 450MeVあるいは$$^{192}$$Os$$^{30+}$$ 490MeVイオンを照射した結果、半径8$$sim$$11nmのナノワイヤーの作製に成功した。また、有機半導体の原料であるポリチオフェンに、長さ120$$mu$$mのPC$$_{61}$$BMナノワイヤーを数密度1$$times$$10$$^{9}$$cm$$^{-1}$$で混合して試作した有機薄膜太陽電池は、ナノワイヤーを混合しない場合に比べて約7%変換効率が増大することを見いだした。これは、ポリチオフェン中に、PC$$_{61}$$BM分子が個々に分散しているよりも、ナノワイヤーとして混合する方が電子の移動度が大きくなるためと考えられる。微細加工が困難なフラーレン誘導体から、イオンビームを用いた技術によりナノワイヤーが作製可能で有り、これを有機薄膜太陽電池へ応用することで、変換効率が向上できることを実証できた。


Microprocessing of arched bridge structures with epoxy resin by proton beam writing

高野 勝昌*; 麻野 敦資*; 前吉 雄太*; 丸井 裕美*; 大道 正明*; 佐伯 昭紀*; 関 修平*; 佐藤 隆博; 石井 保行; 神谷 富裕; et al.

Journal of Photopolymer Science and Technology, 25(1), p.43 - 46, 2012/07

 被引用回数:2 パーセンタイル:91.41(Polymer Science)

The proton beam writing (PBW) with energy of several MeV ranges is a unique tool of three-dimensional microprocessing for a polymer material. Three-dimensional structures like a bridge structure can be fabricated by the double exposures of PBW with two deferent energies followed by the one-time development using etching solution. In this study, the fabrication of an arched bridge was attempted by means of the supercritical drying with liquid carbon dioxide to a SU-8 photoresist film, as the polymer material, coated on a substrate of epoxy sheet, after the PBW process. In the exposures, two patterns of bridge girders and piers were written with 0.5 and 3 MeV proton beams to the SU-8 photoresist films, respectively. After these writings, the photoresist films were developed with the solution of diacetone alcohol and rinsed with the solution of isopropyl alcohol. Then the supercritical drying with liquid carbon dioxide was used at 12 MPa, 40$$^{circ}$$C. As the results, the bridge structures with curved girders to the vertical direction were formed due to the swelling effect of the photoresist film on the drying. In the conference, the microprocessing method of the bridge structure and the swelling effect of the photoresist film will be represented in detail.


Fabrication of concave and convex structure array consisted of epoxy long-nanowires by light and heavy ion beams lithography

高野 勝昌*; 杉本 雅樹; 麻野 敦資*; 前吉 雄太*; 丸井 裕美*; 大道 正明*; 佐伯 昭紀*; 関 修平*; 佐藤 隆博; 石井 保行; et al.

Transactions of the Materials Research Society of Japan, 37(2), p.237 - 240, 2012/06

A three dimensional microfabrication technique for polymer films has been investigated on the basis of fabricating micrometer structures composed of the fine wire structures which were fabricated by the chemical reaction induced along ion tracks of heavy ions with the energy of hundred MeV. In this study, we propose a new hemispherical microfabrication technique of epoxy resin for the fabrication of optical lenses using two times irradiation technique combining proton beam writing and low fluence irradiation of heavy ion beam. At first, an epoxy resin films composed of an etching and a non-etching layers of epoxy resin were irradiated at a frame pattern using a 3 MeV focused proton beam. At second, the low fluence irradiation of 450 MeV $$^{129}$$Xe$$^{23+}$$ was performed by a raster line scanning with oblique angle of 45 degree. Finally, the non-irradiated area of the etching layer of the films were etched by the developer. The observation of the etched films showed that the dome-like structures arrayed with a grid were formed on the non-etching layer of the epoxy resin films. The more detailed observation showed that each dome was composed of the fine wire structures formed by cross-linking reactions induced along the $$^{129}$$Xe$$^{23+}$$ tracks. The domes are expected to function as optical condenser-lenses.


Fabrication of poly(9,9'-dioctylfluorene)-based nano- and microstructures by proton beam writing

前吉 雄太*; 高野 勝昌*; 麻野 敦資*; 丸井 裕美*; 大道 正明*; 佐藤 隆博; 神谷 富裕; 石井 保行; 大久保 猛; 江夏 昌志; et al.

Japanese Journal of Applied Physics, 51(4R), p.045201_1 - 045201_4, 2012/04

 被引用回数:1 パーセンタイル:94.58(Physics, Applied)

A relation between the fluence and the beam-induced chemical reaction in poly(9,9'-dioctylfluorene), PFO, films has been investigated to fabricate PFO-based nano-micro structures using Proton Beam Writing, PBW. In this investigation, we observed that the cross-linking reaction in PFO occurred without a cross-linking agent using PBW. Furthermore, not only the surface morphology but also structure and shape on PFO films were changed from nano-meter to micro-meter size by controlling the fluence of proton beam irradiation on the basis of the investigation. Consequently, the structure of the arabic numbers was successful fabricated as three-dimensional PFO structures with the aspect ratio of 12 at the fluence of 3.5 $$times$$ 10$$^6$$ ions/$$mu$$m$$^2$$ by PBW.


3D micro-fabrication utilized superimposing technique with focused MeV ion beams

高野 勝昌*; 佐藤 隆博; 神谷 富裕; 石井 保行; 大久保 猛; 江夏 昌志; 加田 渉; 杉本 雅樹; 関 修平*; 西川 宏之*

JAEA-Review 2011-043, JAEA Takasaki Annual Report 2010, P. 162, 2012/01

A unique micro-processing technique for epoxy resin films has been developed at the TIARA, utilizing the ion beam writing with multiple energies of light and heavy ion beams. In this study, nano-wire structure fabrication was tried by a superimposing with the proton beams and 520 MeV $$^{40}$$Ar$$^{14+}$$. And in order to reduce the surface tension in developing and drying processes, after a baking at 95 $$^{circ}$$C for 1 minute, developing and drying was performed with super-critical CO$$_{2}$$ at 12 MPa, 40 $$^{circ}$$C. As the result, the bridge structure which strung the wires fabricated by 520 MeV $$^{40}$$Ar$$^{14+}$$ hitting can be observed at the aimed points.


Microbeam complex at TIARA; Technologies to meet a wide range of applications

神谷 富裕; 高野 勝昌; 佐藤 隆博; 石井 保行; 西川 宏之*; 関 修平*; 杉本 雅樹; 奥村 進; 福田 光宏*

Nuclear Instruments and Methods in Physics Research B, 269(20), p.2184 - 2188, 2011/10

 被引用回数:12 パーセンタイル:25.68(Instruments & Instrumentation)

In order to meet wide variety of ion beam applications, three different types of ion microbeam systems were developed. These systems have shown the spatial resolutions of less than 1 $$mu$$m and have made it possible to irradiate minute targets or areas with positioning accuracies of less than 1 $$mu$$m. For micro-analyses, an in-air micro-PIXE system was originally developed on the light ion microbeam system. For micro-fabrication, technique of mask-less ion beam lithography was developed on the light-ion microbeam and other systems. Single-ion-hit technique was also realized to study single-event phenomena in semiconductors or biological cells induced by high-energetic heavy particles. On the other hand, the qualities of the beam from accelerators were important, such as stability of the intensity and the energy of the beams. In this paper, the latest progress and a future prospect of them were discussed.


Nano-micro processing of epoxy resin systems by ion beam lithography with multiple energies and species

高野 勝昌; 佐藤 隆博; 石井 保行; 江夏 昌志; 神谷 富裕; 大久保 猛; 杉本 雅樹; 西川 宏之*; 関 修平*

Transactions of the Materials Research Society of Japan, 36(3), p.305 - 308, 2011/09

Techniques of superimposed ion beam writing with different energies and species have been developed with targeting system at Takasaki Ion Accelerators for Advanced Radiation Application facility, TIARA, of JAEA/Takasaki. A bridge structure was fabricated by the superimposed writing of a girder pattern with 0.5 MeV proton beam adjusting to the bridge pier pattern written with 3 MeV proton beam, using SU-8 photoresist films coated on curing epoxy resin sheets. An upstanding column array with the diameter of sub-micron supported by the bridge structure was fabricated by the spot writing of 260 MeV Ne$$^{7+}$$ single ion hit adjusting to the girder pattern written with the 0.5 MeV proton beams.



榊 泰直; 西内 満美子; 堀 利彦; Bolton, P.; 余語 覚文; 小倉 浩一; 匂坂 明人; Pirozhkov, A. S.; 織茂 聡; 近藤 公伯; et al.

Proceedings of 7th Annual Meeting of Particle Accelerator Society of Japan (DVD-ROM), p.312 - 315, 2010/08



Measured and simulated transport of 1.9 MeV laser-accelerated proton bunches through an integrated test beam line at 1 Hz

西内 満美子; 榊 泰直; 堀 利彦; Bolton, P.; 小倉 浩一; 匂坂 明人; 余語 覚文; 森 道昭; 織茂 聡; Pirozhkov, A. S.; et al.

Physical Review Special Topics; Accelerators and Beams, 13(7), p.071304_1 - 071304_7, 2010/07

 被引用回数:25 パーセンタイル:16.63(Physics, Nuclear)

1.9MeVレーザー駆動陽子線のビームライン中に伝送した。ビームラインは、PMQ, RF cavity,monochrometerからなり、伝送の様子をPARMILAのシミュレーションによって再現した。このような試みは世界初のことである。ビームラインの最終端において、6nsのバンチ幅を道、5%のエネルギースプレッドを持つビームが10%の効率で検出された。この様子はPARMILAにより再現でき、PARMILAコードがレーザー駆動陽子線のビームラインの構築に使用できることを証明した。


Synthesis of ceramic nano fiber from precursor polymer by single particle nano-fabrication technique

杉本 雅樹; 出崎 亮; 吉川 正人; 渡辺 省伍*; 関 修平*

Advances in Polymer Derived Ceramics and Composites; Ceramic Transactions, Vol.213, p.105 - 110, 2010/06



Micrometer-sized magnetic patterning of FeRh films using an energetic ion microbeam

藤田 直樹*; 松井 利之*; 小杉 晋也*; 佐藤 隆博; 齋藤 勇一; 高野 勝昌; 江夏 昌志; 神谷 富裕; 関 修平*; 岩瀬 彰宏*

Japanese Journal of Applied Physics, 49(6), p.060211_1 - 060211_3, 2010/06

 被引用回数:10 パーセンタイル:55.15(Physics, Applied)

FeRh thin films were irradiated with a focused 10 MeV I 2 $$times$$ 2 $$mu$$m$$^{2}$$ ion microbeam at intervals of several $$mu$$m. After the irradiations, the magnetic state at the surface was observed by a magnetic force microscopy (MFM). The micrometer-sized regions which were irradiated with the microbeam show ferromagnetic, and the unirradiated regions remain antiferromagnetic. The present result indicates that the energetic ion microbeam can be used as a tool to produce the micrometer-sized modulation of lateral magnetic state of FeRh films.


Control of radial size of crosslinked polymer nanowire by ion beam and $$gamma$$ ray irradiation

佃 諭志*; 麻野 敦資*; 杉本 雅樹; 出崎 亮; 関 修平*; 田中 俊一郎*

Journal of Photopolymer Science and Technology, 23(2), p.231 - 234, 2010/06

 被引用回数:0 パーセンタイル:100(Polymer Science)

高分子薄膜に入射するイオンビームの飛跡に沿って生じる高濃度活性種により直径ナノオーダーの高分子架橋体を形成し、これを溶媒抽出してナノワイヤー化する単一粒子ナノ加工法では、その太さをイオンビームの線エネルギー付与(LET)により制御できる。このナノワイヤーを触媒材料へ応用するには、金属を内包させ直立構造に形成する必要があるが、現在イオン加速器で利用可能なLETの上限は約15,000ev/nmであり、直立構造を形成するために必要な太さのナノワイヤーが得られていない。そこで、ナノワイヤー径の制御範囲を拡張する方法として、イオン照射後に$$gamma$$線照射を行う新たな方法を開発した。ポリスチレン薄膜にXe 450MeVを照射した後、不活性ガス雰囲気で1Gy/sの$$gamma$$線を照射し、溶媒で未架橋部分を除去してナノワイヤーを作製したところ、$$gamma$$線の吸収線量に伴ってナノワイヤーの半径が増大し、170kGyで$$gamma$$線未照射試料に比べ約2倍に増大することが明らかになった。これは、架橋が不十分で溶媒で除去されていた外周部の分子鎖が、$$gamma$$線照射による架橋で溶媒除去の際に溶け残るようになったためである。今後この方法を、金属元素を内包したセラミックス前駆体高分子材料へ適用し、ナノワイヤー触媒材料の作製を試みる予定である。


Laser-driven proton accelerator for medical application

西内 満美子; 榊 泰直; 堀 利彦; Bolton, P.; 小倉 浩一; 匂坂 明人; 余語 覚文; 森 道昭; 織茂 聡; Pirozhkov, A. S.; et al.

Proceedings of 1st International Particle Accelerator Conference (IPAC '10) (Internet), p.88 - 90, 2010/05



Fabrication of nanowires by varying energy microbeam lithography using heavy ions at the TIARA

神谷 富裕; 高野 勝昌; 石井 保行; 佐藤 隆博; 及川 将一*; 大久保 猛; 芳賀 潤二*; 西川 宏之*; 古田 祐介*; 打矢 直之*; et al.

Nuclear Instruments and Methods in Physics Research B, 267(12-13), p.2317 - 2320, 2009/06

 被引用回数:6 パーセンタイル:53.5(Instruments & Instrumentation)

In TIARA facility of Japan Atomic Energy Agency (JAEA) Takasaki, three-dimensional micro/nano structures with high aspect ratio based on cross linking process in negative resist such as SU-8 have been produced by a technique of mask less ion beam lithography. By bombarding high-energy heavy ions such as 450 MeV Xe$$^{23+}$$ to SU-8, a nanowire could be produced just with a single ion hitting. Then we tried to produce nanowires, of which both ends were fixed in the three-dimensional structure. This paper shows a preliminary experiment using a combination of 15 MeV Ni$$^{4+}$$ ion microbeam patterning and the 450 MeV $$^{129}$$Xe$$^{23+}$$ hitting on SU-8.

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