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3D micro-fabrication utilized superimposing technique with focused MeV ion beams

集束MeVイオンビームの多重描画技術を用いた3次元微細加工

高野 勝昌*; 佐藤 隆博; 神谷 富裕; 石井 保行; 大久保 猛; 江夏 昌志; 加田 渉; 杉本 雅樹; 関 修平*; 西川 宏之*

Takano, Katsuyoshi*; Sato, Takahiro; Kamiya, Tomihiro; Ishii, Yasuyuki; Okubo, Takeru; Koka, Masashi; Kada, Wataru; Sugimoto, Masaki; Seki, Shuhei*; Nishikawa, Hiroyuki*

A unique micro-processing technique for epoxy resin films has been developed at the TIARA, utilizing the ion beam writing with multiple energies of light and heavy ion beams. In this study, nano-wire structure fabrication was tried by a superimposing with the proton beams and 520 MeV $$^{40}$$Ar$$^{14+}$$. And in order to reduce the surface tension in developing and drying processes, after a baking at 95 $$^{circ}$$C for 1 minute, developing and drying was performed with super-critical CO$$_{2}$$ at 12 MPa, 40 $$^{circ}$$C. As the result, the bridge structure which strung the wires fabricated by 520 MeV $$^{40}$$Ar$$^{14+}$$ hitting can be observed at the aimed points.

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