Nano-micro processing of epoxy resin systems by ion beam lithography with multiple energies and species

エネルギー変調異種イオンビーム複合型リソグラフィーによるエポキシ樹脂システムのナノ・マイクロ微細加工

高野 勝昌; 佐藤 隆博; 石井 保行; 江夏 昌志; 神谷 富裕; 大久保 猛; 杉本 雅樹; 西川 宏之*; 関 修平*

Takano, Katsuyoshi; Sato, Takahiro; Ishii, Yasuyuki; Koka, Masashi; Kamiya, Tomihiro; Okubo, Takeru; Sugimoto, Masaki; Nishikawa, Hiroyuki*; Seki, Shu*

Techniques of superimposed ion beam writing with different energies and species have been developed with targeting system at Takasaki Ion Accelerators for Advanced Radiation Application facility, TIARA, of JAEA/Takasaki. A bridge structure was fabricated by the superimposed writing of a girder pattern with 0.5 MeV proton beam adjusting to the bridge pier pattern written with 3 MeV proton beam, using SU-8 photoresist films coated on curing epoxy resin sheets. An upstanding column array with the diameter of sub-micron supported by the bridge structure was fabricated by the spot writing of 260 MeV Ne single ion hit adjusting to the girder pattern written with the 0.5 MeV proton beams.