超音速窒素分子ビームによるTi表面窒化反応ダイナミクス

Nitridation reaction dynamics on Ti(0001) surfaces using a supersonic nitrogen molecular beam

小川 修一*; 高桑 雄二*; 石塚 眞治*; 吉越 章隆 ; 寺岡 有殿; 水野 善之*

Ogawa, Shuichi*; Takakuwa, Yuji*; Ishizuka, Shinji*; Yoshigoe, Akitaka; Teraoka, Yuden; Mizuno, Yoshiyuki*

Ti表面での窒素吸着反応ダイナミクスを明らかにするために、超音速窒素分子ビームを用いたTi(0001)表面窒化過程を光電子分光でリアルタイム観察し、窒素分子の吸着状態を識別して初期吸着確率の運動エネルギー依存性を調べた。N1 s光電子ピークはふたつの成分から成り立っている。成分ごとの吸着曲線から初期吸着確率の運動エネルギー依存を求めた。ふたつの成分ともほぼ同様の依存性を示した。0.3eV以下では物理吸着状態を経由した解離吸着が主であり、0.3eV以上では直接解離吸着が主となることがわかった。

In order to study adsorption reaction dynamics of nitrogen molecules at Ti surfaces, Ti(0001) nitridation processes via supersonic nitrogen molecular beams were observed by real-time photoelectron spectroscopy. Incident energy dependence of initial sticking probability was investigated for each adsorption state of nitrogen molecules. The N1s photoemission peak consists of two components. The incident energy dependence of initial sticking probability was obtained from adsorption uptake curves for each component. The two components revealed almost same tendency. It was indicated that dissociative adsorption via a physical adsorption state was a major process in the incident energy less than 0.3 eV, and direct adsorption took place mainly in the incident energy larger than 0.3 eV.